2016
DOI: 10.1039/c6ra18152j
|View full text |Cite
|
Sign up to set email alerts
|

Investigation of silicon wear against non-porous and micro-porous SiO2 spheres in water and in humid air

Abstract: Tribochemical wear, a method to achieve controlled material removal without residual damage on substrates, plays a very important role in super-smooth silicon surface manufacturing.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
10
0

Year Published

2017
2017
2022
2022

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 22 publications
(10 citation statements)
references
References 47 publications
0
10
0
Order By: Relevance
“…Finally, besides interfacial forces, surface wear caused by frictional shear stress is likely to complicate the dynamics [4,159]. Tribochemical reactions may occur between water molecules and the solid surface when the activation energy of these reactions is reduced by an external mechanical action [5,[160][161][162][163][164][165][166][167]. The structure and surface energy of the adsorbed water layer on dynamically changing tribological interfaces may also play vital roles in the mechanochemistry involved in the material removal phenomenon.…”
Section: Perspectivesmentioning
confidence: 99%
“…Finally, besides interfacial forces, surface wear caused by frictional shear stress is likely to complicate the dynamics [4,159]. Tribochemical reactions may occur between water molecules and the solid surface when the activation energy of these reactions is reduced by an external mechanical action [5,[160][161][162][163][164][165][166][167]. The structure and surface energy of the adsorbed water layer on dynamically changing tribological interfaces may also play vital roles in the mechanochemistry involved in the material removal phenomenon.…”
Section: Perspectivesmentioning
confidence: 99%
“…Last but not least, as we know, the CMP performance depends on the balance between chemical and mechanical effects. For a chemical reaction, Qi et al [65] reported that mesoporous abrasives can store water in their micropores, increasing their chemical activity in the CMP process. According to the BJH pore volume results, the RmSiO 2 -1 has the largest pore volumes due to its abundant micropores.…”
Section: Science China Materialsmentioning
confidence: 99%
“…Fig.4B. The identified bands were assigned according to literature data(Alkrad, Mrestani, Stroehl, Wartewig, & Neubert, 2003;Cai, Neyer, Kuckuk, & Heise, 2010;Jayes, Hard, Séné, Parker, & Jayasooriya, 2003;Kotzianová, Rebícek, Pokorný, Hrbác, & Velebný, 2016;Qi et al, 2016;Sánchez-Téllez, Téllez-Jurado, Rodríguez-Lorenzo, Mazo et al, 2017; Sun, Yanagisawa, Kunimoto, Nakamura, & Homma, 2016;Sun, Yanagisawa, Kunimoto, Nakamura, & Homma, 2017;Tamayo & Rubio, 2010). Several Raman bands related to sodium hyaluronate hydrogels and silica-based hybrid materials are observed in the HA-based hybrid hydrogels Raman spectra.…”
mentioning
confidence: 99%
“…Several Raman bands related to sodium hyaluronate hydrogels and silica-based hybrid materials are observed in the HA-based hybrid hydrogels Raman spectra. The most important Raman scattering due to different bond vibrations related to sodium hyaluronate (HA)(Alkrad et al, 2003;Kotzianová et al, 2016), chemical modification of HA with APTES(Sun et al, 2016(Sun et al, , 2017 and PDMS-modified SiO 2 crosslinked matrix(Qi et al, 2016; Sun et al, 2016) in the HA-based hybrid hydrogels are: 1) the band at 820 cm -1 is due to stretching vibrations of − − C O C bonds from the hyaluronic acid repetitive units (D-glucuronic acid and N-acetyl-D-glucosamine, linked via alternating β-(1→ 4) and β-(1→3) glycosidic bonds); 2) the band around 1415 cm -1 may be assigned to the bending vibration of CH 2 group bonded to the Si atom − Si CH ( ) 2 ; 3) the band at 1135 cm -1 is attributed to the − − Si O Si bond-bending vibration; 4) the bands around 1036 cm -1 and 945 cm -1 are assigned to − − O Si O bonds; 5) the band around 980 cm -1 is due to − Si OH bonds. Likewise, the following bands show the correct incorporation of PDMS into the SiO 2 network(Cai et al, 2010;Jayes et al, 2003;Sánchez-Téllez, Téllez-Jurado, Rodríguez-Lorenzo, Mazo et al, 2017;Tamayo & Rubio, 2010): 1) the bands around 1415 cm -1 and 1265 cm -1 are assigned to the asymmetric and symmetric bending vibration of CH 3 group from PDMS, respectively; 2) the band at 865 cm -1 is attributed to the symmetric rocking of CH 3 from PDMS; 3) the band at 790 cm -1 is due to − − C Si C asymmetric stretching vibration and to the rocking vibration of CH 3 group from PDMS; 4) the band at 707 cm -1 is due to − − C Si C symmetric stretching vibration; 5) the band at 689 cm -1 is attributed to − Si CH 3 symmetric rocking; 6) the band at 495 cm -1 is assigned to − − O Si O bonds.…”
mentioning
confidence: 99%
See 1 more Smart Citation