“…Among all, wet etching is a low cost, high throughput, and easy handling procedure, which brings a good balance between the efficiency and cost of the solar cells [2,11,24]. Potassium hydroxide and tetramethylammonium hydroxide (TMAH) are the two most extensively used alkaline solutions for surface texturing of silicon [5,8,[12][13][14]24]. Out of these two etchants, TMAH is popular because it provides better etch selectivity between silicon and silicon dioxide and offers compatibility with the CMOS process [3,8,12,[14][15][16]24].…”