Abstract:Wet anisotropic etching of Si{100} results in micro-pyramids/hillocks bounded by four {111} planes. These kinds of geometrical structures are needed to reduce the front surface reflectance from silicon by taking multiple internal reflections of the incident ray and thus increase the efficiency of the solar cells. In this work, surface texturing of Si{100} is performed at different temperatures in a very low concentration CMOS compatible tetramethylammonium hydroxide (TMAH) without using any additive and agitat… Show more
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