2022
DOI: 10.1149/2162-8777/aca796
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Investigation of Mo Doping Effects on the Properties of AlN-Based Piezoelectric Films Using a Sputtering Technique

Abstract: In this study, AlN-based films are deposited using a sputtering deposition method, and Mo dopants with different concentrations are added in the proposed system by controlling the sputtering power in order to improve the crystallinity and piezoelectric properties of AlN films. Through a detailed material analysis including energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), piezoresponse force microscopy (PFM), and nano-indenta… Show more

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Cited by 4 publications
(3 citation statements)
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References 19 publications
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“…), TM-N bonds become weak and move the TM atoms closer to the centers of the three nearby N atoms. It was found that the place of the TMs was strongly linked to their group number (Akiyama et al, 2009a;Akiyama et al, 2009b;Luo et al, 2009;Liu et al, 2013;Mayrhofer et al, 2015;Hu et al, 2018;Manna et al, 2018;Yanagitani and Jia, 2019;Fiedler et al, 2021;Feng et al, 2022;Lv et al, 2023a;Patidar et al, 2023;Zha et al, 2023). For Mo dopant, piezoelectric coefficient d 33 of AlN: Mo (3.46%) films reached to 7.33 pm/V (Zha et al, 2023).…”
Section: Aln Piezoelectric Filmsmentioning
confidence: 99%
“…), TM-N bonds become weak and move the TM atoms closer to the centers of the three nearby N atoms. It was found that the place of the TMs was strongly linked to their group number (Akiyama et al, 2009a;Akiyama et al, 2009b;Luo et al, 2009;Liu et al, 2013;Mayrhofer et al, 2015;Hu et al, 2018;Manna et al, 2018;Yanagitani and Jia, 2019;Fiedler et al, 2021;Feng et al, 2022;Lv et al, 2023a;Patidar et al, 2023;Zha et al, 2023). For Mo dopant, piezoelectric coefficient d 33 of AlN: Mo (3.46%) films reached to 7.33 pm/V (Zha et al, 2023).…”
Section: Aln Piezoelectric Filmsmentioning
confidence: 99%
“…The increased slope of d 33 was larger than that in Sc x Al 1-x N, but the enhancement of d 33 in Cr x Al 1-x N only appeared at low x. Similar to the behavior in Cr, the d 33 increased in Mo x Al 1-x N with x up to 0.0346 [117]. Other TMs such as Ti [118,119], Mg [120], Ta [121,122] and V [121], were also investigated.…”
Section: Aln and Its Alloysmentioning
confidence: 81%
“…AlN is a piezoelectric material that is used in a wide range of applications within the MEMS field, because of its great mechanical properties, enough chemical resistance to microfabrication processes, conventional deposition methods, and acceptable electromechanical coupling factor (k 2 ef f ) [3,4]. The main linear applications where AlN is used as piezoelectric material are resonators [5,6], tunable devices [7], several types of sensors [8], actuators [9], wearable devices [10], and generally where the layers at the microscale with piezoelectric effect are needed [11]. In all of those applications, the main characteristics offered by piezoelectric materials are low power consumption (around 10 µW), easy design techniques, CMOS compatibility, high operation frequencies, and high quality factor for frequency applications.…”
Section: Introductionmentioning
confidence: 99%