Investigation of Magnetic Characteristics for a FeCo/Si Multilayer with the Variation of the Bias Potential at Substrate

Abstract

x-ray, polarized neutron scattering and SQUID are used to investigate the growth of the sputtered Fe 89 Co 11 -Si multilayers to determine the crystallization and it's influence on the magnetic properties. These properties depend on the sputtering parameters. The substrate temperature during deposition is found to have the most important influence on the crystallinity. High energy on the substrate achieved by means of an Argon bombardment under a bias potential of -70 V produces a large crystallinity of the Fe 89 Co 11 material. On the contrary, a low energy on the substrate under a bias potential of +100 V and floating, results in a low crystallinity. In the x-ray measurements of the monochromators deposited with the bias potential of -70 V, the (110) peak of Fe 89 Co 11 is observed with nearly a hundredfold more intensity than the one with the bias potential of +100 V and floating. The minus bias potential leads to a high coercivity but reduced remanence compared with the floating. The +100 V bias potential gives rise to a distinct magnetic anisotropy and in the soft direction the remanence achieved is 94%.