2014
DOI: 10.1109/jphotov.2014.2312485
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Investigation of Lifetime-Limiting Defects After High-Temperature Phosphorus Diffusion in High-Iron-Content Multicrystalline Silicon

Abstract: Abstract-Phosphorus diffusion gettering of multicrystalline silicon solar cell materials generally fails to produce material with minority-carrier lifetimes that approach that of gettered monocrystalline wafers, due largely to higher levels of contamination with metal impurities and a higher density of structural defects. Higher gettering temperatures should speed the dissolution of precipitated metals by increasing their diffusivity and solubility in the bulk, potentially allowing for improved gettering. In t… Show more

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Cited by 12 publications
(13 citation statements)
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“…The EXT process was chosen due to its enhanced iron gettering efficiency compared to the STD process. 9 In the as-grown state, chromium precipitates were detected by l-XRF along the random-angle grain boundary (Fig. 1), consistent with the behavior of other metals in silicon wherein metal precipitate nucleation is favored at bulk heterogeneous nucleation sites.…”
supporting
confidence: 72%
See 1 more Smart Citation
“…The EXT process was chosen due to its enhanced iron gettering efficiency compared to the STD process. 9 In the as-grown state, chromium precipitates were detected by l-XRF along the random-angle grain boundary (Fig. 1), consistent with the behavior of other metals in silicon wherein metal precipitate nucleation is favored at bulk heterogeneous nucleation sites.…”
supporting
confidence: 72%
“…Iron, for example, has been well-studied, and kinetics process simulation tools exist to engineer its distribution in the material. [6][7][8][9]33 The impact of processing steps on chromium (both precipitated and interstitial) has not been studied as extensively, although the detrimental nature of the impurity is well-known. The maximum allowable chromium contamination in the silicon melt ranges from 1 Â 10 15 cm À3 to 2 Â 10 17 cm À3 depending on the growth process, device architecture, and target efficiency.…”
mentioning
confidence: 99%
“…However, this behaviour would be surprising for a distributed (metal) impurity, since gettering should be more efficient in good grains like area I [10] due to the absence of competing internal gettering sites. It is also suspected that gettering can reduce the dislocation density [11].…”
Section: Discussionmentioning
confidence: 99%
“…[ 77 ] Adding a low-temperature step drives this dissolved iron to segregate to the emitter, producing signifi cantly better material performance. [ 39,75 ] The average lifetime after the higher-temperature steps is now limited by high structural defect density, [ 83 ] where phosphorus diffusion is known to be relatively ineffective. [ 84,85 ] To quantify the contributions of the high-and low-temperature components of the diffusion profi le to the lifetime improvement seen in the GA process optimization results and the experimental samples, we simulate a sensitivity analysis of the time-temperature process variables.…”
Section: Process Optimization Resultsmentioning
confidence: 99%