Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica

Xu, Mingjin; Shi, Feng; Zhou, Lin; Dai, Yifan; Peng, Xiaoqiang; Liao, Wenlin

doi:10.1364/oe.25.029260

Cited by 26 publications

(14 citation statements)

References 20 publications

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“…Compared with the above combined techniques, IBE does not introduce iron contamination or residual precipitations into the fused silica surface. A peer-reviewed research has shown that IBE can remove polishing residual contamination from the surface of optics to improve LIDT while maintaining surface precision to obtain a supersmooth surface [18][19][20]. As a potential nanometer precision postprocessing technology, IBE can be utilized to mitigate nanoscale damage precursors in the present study [18].…”

Section: Introductionmentioning

confidence: 91%

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

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Section: Introductionmentioning

confidence: 91%

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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“…As shown in the results in Section 3.2 and Section 3.3 , it was easy to obtain a low-absorption surface by the MRF, CCOS, IBF and shallow DCE combined techniques, and the LIDT was much higher than others. In previous studies in our laboratory, we had already realized the advantages of MRF, IBF pre-treatment techniques [ 19 , 22 ]. For MRF techniques, high-efficiency material removal was achieved under the contacting between the flexible polishing ribbon and the optical surface, without introducing sub-surface damage.…”

Section: Discussionmentioning

confidence: 99%

“…During the IBF process, the impurities could be effectively removed and would not introduce new damage [ 18 ]. The LIDT of the optics could reach up to 10.5 J/cm 2 [ 19 ]. Magnetorheological finishing (MRF) was a flexible polishing technique with the advantages of high efficiency, high surface accuracy and low sub-surface damage, which had been used in the pre-treatment process of fused silica optics [ 20 ].…”

Section: Introductionmentioning

confidence: 99%

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

et al. 2021

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The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

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“…In order to achieve batch and high-efficiency removal of the small-scale damage points without inducing new damage, this paper adopts the magnetorheological (MR) removing method to repair the damaged fused silica components. The MR removing method has the characteristics of high-efficiency removal, strong controllability, and good surface quality [ 18 ]. The biggest difference between the MR removing and traditional methods is that it is based on the shear removal.…”

Section: Introductionmentioning

confidence: 99%

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method

et al. 2021

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The damage repair of fused silica based on the CO2 laser repair technique has been successfully applied in high-power laser systems in the controllable nuclear fusion field. However, this kind of repairing technique mainly focuses on large-scale laser damage with sizes larger than 200 μm, but ignores the influence of cluster small-scale damage with sizes smaller than 50 μm. In order to inhibit the growth of small-scale damage and further improve the effect of fused silica damage repair, this paper carried out a study on the repair of fused silica damage using the magnetorheological (MR) removing method. The feasibility of fused silica damage repairing was verified, and the evolution law of the number, morphology, and the surface roughness of small-scale damage were all analyzed. The results showed that the MR removing method was non-destructive compared to traditional repairing technologies. It not only effectively improved the whole damage repairing rate to more than 90%, but it also restored the optical properties and surface roughness of the damaged components in the repairing process. Based on the study of the MR removing repair law, a combined repairing process of 4 μm MR removal and 700 nm computer controlled optical surfacing (CCOS) removal is proposed. A typical fused silica element was experimentally repaired to verify the process parameters. The repairing rate of small-scale damage was up to 90.4%, and the surface roughness was restored to the level before repairing. The experimental results validate the effectiveness and feasibility of the combined repairing process. This work provides an effective method for the small-scale damage repairing of fused silica components.

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Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica

Cited by 26 publications

References 20 publications

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method

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