2014
DOI: 10.1002/pssa.201330636
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Investigation of ISFET device parameters to optimize for impedimetric sensing of cellular adhesion

Abstract: In this study we describe how we were able to use an equivalent‐electrical circuit for the cell–transistor contact to optimize a future chip design for better performance in cell–substrate adhesion experiments. From our simulations we found that higher capacitances of the source and drain contact lines are able to shift the cell adhesion effects to more moderate frequencies in the range of up to 200 kHz. For larger cell–substrate adhesion effects, the transconductance value of the FET devices needs to be incre… Show more

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Cited by 13 publications
(11 citation statements)
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“…This makes an exact description of the TTF spectra very complex. In earlier publications, we applied PSPICE modeling to describe the ISFET devices for recoding of cellular adhesion . With minor simplifications, also analytical solutions for the transfer function H ( jω ) can be found .…”
Section: Methodsmentioning
confidence: 99%
“…This makes an exact description of the TTF spectra very complex. In earlier publications, we applied PSPICE modeling to describe the ISFET devices for recoding of cellular adhesion . With minor simplifications, also analytical solutions for the transfer function H ( jω ) can be found .…”
Section: Methodsmentioning
confidence: 99%
“…All FET devices used in this study have been optimized, therefore providing better results for impedimetric sensing of cellular adhesion (Susloparova et al, 2014). The present FET devices have the almost flat surfaces by minimizing the height of the edges between the contact lines and the open transistor gate area, which allow the T cells to migrate almost unaffected by topographical obstacles (Fig.…”
Section: Discussionmentioning
confidence: 99%
“…The step height was measured using atomic force microscopy and was found to be approximately 200 nm. With this new device design, cells are no longer preferably adhered on the edge of the contact lines instead of the transistor gate area (Susloparova et al, 2014). Additionally, the size of a transistor gate of our devices is in comparison to the size of an attached single T cell.…”
Section: Discussionmentioning
confidence: 99%
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