Abstract:Three alternate TiN/AlN nanostructured multilayers with the TiN layer thicknesses of 60, 70, and 120 Å and the AlN layer thickness of 10 Å were fabricated using dc reactive magnetron sputtering. Microstructural characterizations of the three nano-scale films were performed using nonpolarized specular neutron reflectometry. The results showed that the three TiN/AlN multilayer thin films were typical superlattice films and the thicknesses of the TiN layer and AlN layer in the multilayers were consistent with the… Show more
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