2008
DOI: 10.1016/j.tsf.2007.08.098
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Investigation of hexadecanethiol self-assembled monolayers on cadmium tin oxide thin films

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Cited by 7 publications
(12 citation statements)
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“…This Zn 32 O 32 orthorhombic cell (a ) 6.95 Å, b ) 12.05 Å, and c ) 11.14 Å) was used to study oxygen depletion in the n-type conduction mechanism as previously described for cadmium tin oxide and doping. 47 Oxygen depletion stoichiometries ranging from Zn 32 O 32 to Zn 32 O 26 were studied by random removal of oxygen atoms from random positions as previously described 47 for undoped and aluminum-doped (1.6, 3.1, and 4.7%) zinc oxide structures. Periodic boundary conditions were used to determine the bulk electronic and optical properties of the metal oxide thin film.…”
Section: T H Imentioning
confidence: 99%
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“…This Zn 32 O 32 orthorhombic cell (a ) 6.95 Å, b ) 12.05 Å, and c ) 11.14 Å) was used to study oxygen depletion in the n-type conduction mechanism as previously described for cadmium tin oxide and doping. 47 Oxygen depletion stoichiometries ranging from Zn 32 O 32 to Zn 32 O 26 were studied by random removal of oxygen atoms from random positions as previously described 47 for undoped and aluminum-doped (1.6, 3.1, and 4.7%) zinc oxide structures. Periodic boundary conditions were used to determine the bulk electronic and optical properties of the metal oxide thin film.…”
Section: T H Imentioning
confidence: 99%
“…Observed reflectivity changes as a result of plasmon oscillations have been demonstrated in ITO by FTIR and SPR spectroscopy. 23,47,48 Therefore, similar investigations are warranted in AZO. In addition, studies of SAM formation on conducting metal oxides have also been previously described in the literature for TCOs such as ITO and CTO.…”
Section: Introductionmentioning
confidence: 98%
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“…This can be compared with the lithography process on molecular level [12,13]. Chemisorbed thiols organized on the surface of transparent semiconductors, like ITO or cadmium-tin oxide, modify profoundly the optical properties of such materials, which is applied in the construction of optical nanodevices [14]. Commonly thiols are x-functionalized, i.e.…”
Section: Introductionmentioning
confidence: 99%
“…chemical vapor deposition (CVD) method 10,11,[13][14][15] and magnetron sputtering technology. 12 It is evident that these two approaches usually need not only high temperature (about from 400 • C to 700 • C) but also expensive and sophisticated instruments to control assistantly, unsuitable to prepare in large scale.…”
Section: Introductionmentioning
confidence: 99%