Investigation of CuAl IMCs Corrosion in Chloride Environment and its Prevention Strategy

Abstract

In most current wire-bonding applications, electrical interconnection is accomplished by fine Cu wires bonded to Al bonding pads microfabricated on an IC chip and external contact pins of the PCB board. Corrosion-related failure defects between the Cu wire and Al bond pad have been an ongoing un-trackable reliability issue plaguing the IC packaging industry for the past ten years, despite approaching ppb levels. Most prior studies hypothesized that intermetallic compounds (IMCs) like Cu9Al4, and CuAl2 were responsible for the observed acute wire-bond lift-off corrosion defects. Further studies sought to quantify the rates of corrosion of these IMCs and explore the effects of mitigation efforts of adding Pd, relevant to Pd-coated Cu wire-bonding. However, utilizing a novel real-time corrosion screening approach, we previously established that peripheral bimetallic contact between Cu ball-bonds and Al bond pads also plays a substantial role in the aggressive Al pad corrosion, induced by chloride ion penetration, which often leads to device failure. In this work, we further explored the role of IMCs corrosion in wire-bond lift-off failure utilizing fundamental electrochemical studies to quantify rates of galvanic-induced corrosion of IMCs within the broader context of an interconnected stack of Al bond pad, Cu-Al IMCs and Cu bonding wire. We also explored the use of a corrosion inhibitor to suppress the galvanic corrosion currents of Al bond pad, and Al-rich IMCs when electrically connected to Cu wire or Cu-rich IMCs.