2018
DOI: 10.1016/j.rinp.2018.03.060
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Investigating the effect of sputtering conditions on the physical properties of aluminum thin film and the resulting alumina template

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Cited by 12 publications
(4 citation statements)
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“…These values are consistent with the Al and Sc layer thickness in each sample and confirm that the 20 nm Al layers are more strongly crystallized than the Sc ones. Similar values for magnetron sputtered Al have been reported in previous work [26,27].…”
Section: Large Angle X-ray Diffraction Results For Al/sc Multilayer C...supporting
confidence: 90%
“…These values are consistent with the Al and Sc layer thickness in each sample and confirm that the 20 nm Al layers are more strongly crystallized than the Sc ones. Similar values for magnetron sputtered Al have been reported in previous work [26,27].…”
Section: Large Angle X-ray Diffraction Results For Al/sc Multilayer C...supporting
confidence: 90%
“…Most of the provided experiments focused on obtaining oxides on glasses as intermediate materials for further use as substrates for xerogels, conductive electrodes, templates for the synthesis of nanopillars, etc. [17][18][19][20][21]. The production of anodic oxide on the dielectric glass substrate is associated with several difficulties.…”
Section: Of 12mentioning
confidence: 99%
“…A wide range of interacting factors influence magnetron deposition of thin films. These include gas composition (Bose et al ., 2018; Ţălu et al ., 2018), flow rate/pressure (Ma et al ., 2019; Lee et al ., 2020; Shakoury et al ., 2020), deposition time (Dallaeva et al ., 2012; Ma et al ., 2019; Lee et al ., 2020), deposition rate (Taheriniya et al ., 2018), power (Ma et al ., 2019; Lee et al ., 2020), distance of substrate from target (Sangwaranatee et al ., 2018), substrate temperature (C. Taheriniya et al ., 2018; Ma et al ., 2019; Rajabi Kalvani et al ., 2019) and the target fabrication process (Wu et al ., 2012, 2019; Liu et al ., 2020). Since the target itself is one of the key factors contributing to the microstructure of the substrate, the evaluation of plasma–microstructure is key to not only better understanding the process but also to allow for optimisation (Dallaeva et al ., 2012; Wu et al ., 2019; Chen et al ., 2020).…”
Section: Introductionmentioning
confidence: 99%
“…When competing phases occur, secondary phases may emerge leading to various effects such as Zener pinning that ultimately affect the local chemical reactivity (Huang et al ., 2018; Thiruvalluvan et al ., 2018). Additionally, we have previously shown that the aluminium sputter conditions can alter the micromorphology of the anodised alumina (Taheriniya et al ., 2018). Several studies have shown obstructions (e.g.…”
Section: Introductionmentioning
confidence: 99%