Optical, structural and aging properties of Al/Sc-based multilayers for the extreme ultraviolet

Rebellato, Jennifer; Soufli, Régina; Meltchakov, Evgueni; Gullikson, Eric M.; Rossi, Sébastien de; Baumier, Cédric; Pallier, F.; Delmotte, F.

doi:10.1016/j.tsf.2021.138873

Cited by 5 publications

(12 citation statements)

References 27 publications

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“…A considerable amount of research has been published on the development of multilayers in the EUV range generally designed to work at normal incidence [7,[12][13][14]. Al-based structures such as Al/Mo/B 4 C and Al/Mo/SiC achieve a peak reflectance of more than 50% at normal incidence for a photon energy lower than 70 eV [15].…”

Section: Introductionmentioning

confidence: 99%

“…Multilayers containing Sc and Al have already been introduced for applications in attosecond physics, coherent light sources (synchrotrons, EUV lasers, and high-harmonic generation, etc. ), and astrophysics [13]. These multilayers show a high reflectance, ranging from 42 to 56% for energies from 30 to 24 eV (40-51 nm) at near normal incidence (5 • ) with a bandwidth between 2.2 and 2.6 eV.…”

Section: Introductionmentioning

confidence: 99%

“…These multilayers show a high reflectance, ranging from 42 to 56% for energies from 30 to 24 eV (40-51 nm) at near normal incidence (5 • ) with a bandwidth between 2.2 and 2.6 eV. The aging properties of Al/Sc multilayers were also studied, showing a good temporal stability after a period of time of nine months [13]. In the present work, we are interested in the design of multilayer systems for energies from 45 to 55 eV (wavelength between 27.5 and 22.5 nm), corresponding to the lithium K spectral range.…”

Section: Introductionmentioning

confidence: 99%

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Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Hassebi,

Meltchakov,

Delmotte

et al. 2024

Applied Sciences

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This paper presents an X-ray reflectivity study of a Sc/SiC/Al periodic multilayer deposited via magnetron sputtering and its possible adaptation to be used as a dispersive element in the crystal spectrometers equipping scanning electron microscopes and electron probe microanalyzers. This multilayer is designed for the spectral range of 45–60 eV. The results reveal a reflectance of 40.8% at 54.1 eV for a near-normal incidence angle of 7° with a narrow bandwidth of 2.6 eV. The measured and simulated reflectivity curves are very close, suggesting that this system has smooth interfaces and low interdiffusion. Owing to the growing importance of lithium and lack of spectroscopic data, we simulate a new Sc/SiC/Al stack based on the reflectivity data and optimize it to perform spectroscopy in the range near the Li K absorption edge around 55 eV, which is in the spectral range of the Li Kα emission band. This optimization is achieved by tuning the thicknesses of the different layers and the number of periods of the multilayer using an in-house Python script. The optimization results are compared with the performances of other multilayers employed in the same energy range and at a working angle close to 30° grazing, including Be/Si/Al. This analysis indicates that the Sc/SiC/Al multilayer could be a good candidate for performing spectroscopy in the Li K range.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Hassebi,

Meltchakov,

Delmotte

et al. 2024

Applied Sciences

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“…Yet, the available refractive index values in the EUV/x-ray are often unreliable [8]. For instance, the experimental reflectance of high-efficiency Al/Scbased multilayers at long-EUV wavelengths cannot be properly calculated using the best available refractive index [9,10]. Likewise, the simulated reflectance of Cr/B4C multilayers near the Cr L2,3 edge is unable to predict the experimental Bragg peak bandwidth and surrounding features [11].…”

Section: Introductionmentioning

confidence: 99%

EUV refractive index measurements with improved accuracy and their impact in component modeling

Delmotte

Soufli

Burcklen

et al. 2023

Optical and EUV Nanolithography XXXVI

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Precise knowledge of the wavelength-dependent refractive index of materials is required to accurately design, build and calibrate the in-band and out-of-band performance of EUV/x-ray instruments. Such instruments include exposure and patterning tools, imagers, microscopes and spectrometers for photolithography, plasma physics, synchrotron and laser science, solar physics and astrophysics. Yet, the available refractive index values in the EUV/x-ray are often unreliable. This is due to the extreme sensitivity of materials to contamination and oxidation, to the difficulty in fabricating appropriate thin film samples, to the presence of near-edge absorption fine structure, and to multiple reflections present at the longer EUV wavelengths, which are complicating the measurements. We are presenting a new methodology to measure the EUV refractive index and new sets of measurements for several important EUV materials. We use combinations of transmittance and reflectance data in the spectral range 826.5 eV (1.5 nm) to 15 eV (82.5 nm) and reveal for the first time highly resolved fine structure in the regions of L, M, N and O absorption edges, in both the absorptive and dispersive portions of the refractive index, resulting in improvements of up to a factor of 3 compared to earlier values. The improved refractive index accuracy is validated by sum rule tests and by simulating experimental data of multilayer coatings containing these materials.

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“…Extreme ultraviolet (EUV), and soft X-ray (SXR) multilayer optics have achieved considerable improvement in the last decades, stimulated by applications such as solar and space physics, EUV photolithography, high energy density science, ultra-fast science, and scientific instrumentation for synchrotron sources and free electron lasers. New and efficient multilayer structures have been proposed for a wide spectral range in different geometries: onedimension (Planner), [1][2][3][4] two-dimension (grating), [5][6][7] and three-dimension. 8 In particular, multilayer interference coatings are required to obtain efficient diffraction gratings in the SXR and EUV spectral domains.…”

Section: Introductionmentioning

confidence: 99%

Development of multilayer gratings for Solar-C EUV spectro-imager

Mahmoud¹,

Rossi²,

Meltchakov³

et al. 2023

EUV and X-Ray Optics: Synergy Between Laboratory and Space VIII

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We present here experimental results and modeling of multilayer gratings developed for the EUV spectro-imager abroad Solar-C mission. Periodic Al/Mo/SiC multilayers were optimized and deposited by magnetron sputtering on high groove density lamellar gratings with various depths. All grating samples were characterized before and after multilayer deposition by atomic force microscopy (AFM) and by grazing incidence x-ray reflectometry (GIXR) at 8.05 keV. AFM measurements reveal the surface prole evolution when the number of deposited layers increases. This effect is confirmed with a transmission electron microscope cross-section analysis. The EUV diffraction efficiency of the multilayer gratings was measured by monochromatic synchrotron radiation on the XUV Metrology beamline at SOLEIL Synchrotron. The results are in good agreement with the model simulated by rigorous coupled-wave analysis and using structural parameters determined by AFM and GIXR. The measured near-normal incidence first-order efficiency reaches a maximum of about 9.27%, 6.54%, and 7.18% at wavelengths of 27.3 nm, 21.4 nm, and 19.4 nm respectively.

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Optical, structural and aging properties of Al/Sc-based multilayers for the extreme ultraviolet

Cited by 5 publications

References 27 publications

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

Sc/SiC/Al Multilayer Optimization for Li K Spectroscopy

EUV refractive index measurements with improved accuracy and their impact in component modeling

Development of multilayer gratings for Solar-C EUV spectro-imager

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