Phthalocyanines (Pc),
with or without metal ligands, are still
of high research interest, mainly for the application in organic electronics.
Because of rather low solubility, Pc-based films are commonly deposited
applying various advanced and demanding vacuum techniques, like physical
vapor deposition (PVD). In this work, an alternative straightforward
approach of NiPc layer formation is proposed in which NH2-side groups of nickel(II) tetraamino-phthalocyanine (AmNiPc) are
engaged in the process of electrochemical deposition of (AmNiPc)layer on indium-tin oxide (ITO) substrates. The resulting layer
is widely investigated by cyclic voltammetry, atomic force microscopy,
UV–vis, and ATR-IR spectroscopies, X-ray diffraction, and photoemission
techniques: X-ray and UV-photoelectron spectroscopies. The chemical
and electronic structure of (AmNiPc)layer is characterized.
It is shown that the electronic properties of the formed (AmNiPc)layer/ITO hybrid correspond to the ones previously reported
for PVD-NiPc films.