Invention of Integrated Circuits - Untold Important Facts

Saxena, Arjun N

doi:10.1142/9789812814463

Cited by 8 publications

(3 citation statements)

References 13 publications

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“…Starting with the turing machine in 1936-1937 [77], it provided the basis for modern computer science and foundational models of computability. However, a pivotal moment came in 1947 when the transistor was frst demonstrated in Bell Laboratories [78], paving the way for the Integrated Circuit (IC) in 1959 [79] which in turn led to the Intel 8086 central processing unit. Te 8086's x86 architecture was at the core of the low-cost IBM PC, with its legacy which is still alive today in most laptops and workstations and is even embedded into the US Space shuttle program [80].…”

Section: Technological Velocitymentioning

confidence: 99%

Interpretations of Innovation: The Role of Technology in Explanation Seeking Related to Psychosis

Higgins

Short

Chalup

et al. 2023

Perspectives in Psychiatric Care

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Background. The prominence of technology in modern life cannot be understated. However, for some people, these innovations or their related plausible advancements can be associated with perceptual misinterpretation and/or incorporation into delusional concepts. Objective. This paper aims to explore the intersection of technological advancement and experiencing psychosis. We present a discussion about the explanation seeking that incorporates the concept, that for some people, of technological innovation becoming intertwined with delusional symptoms over the past 100 years. Methods. A longitudinal review of the literature was conducted to synthesize and draw these concepts together, mapping them to a timeline that aligns computing science and healthcare expertise and presents the significant technological changes of the modern era charted against mental health milestones and reports of technology-related delusions. Results. It is possible for technology to be incorporated into the content of delusions with evidence supporting a link between the rate of technological change, the content of delusions, and the use of technology as a way of seeking an explanation. Moreover, analysis suggests a need to better understand how innovations may impact the mental health of people at risk of psychosis and other mental health conditions. Conclusions. Clinical experts and lived experience experts need to be informed about and collaborate with future research and development of technology, specifically artificial intelligence and machine learning, early in the development cycle. This concurs with other artificial intelligence research recommendations calling for design attention to the development and implementation of technological innovation applied in a mental health context.

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Section: Technological Velocitymentioning

confidence: 99%

Interpretations of Innovation: The Role of Technology in Explanation Seeking Related to Psychosis

Higgins

Short

Chalup

et al. 2023

Perspectives in Psychiatric Care

View full text Add to dashboard Cite

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“…55 There are more than one transistor in an integrated circuit and thus device isolation is necessary. Kurt Lehovec (1918Lehovec ( -2012 pioneered "junction isolation".…”

Section: Invention Of the Integrated Circuitmentioning

confidence: 99%

Introduction to the History of Semiconductors

Lau¹

2017

ULSI Front-End Technology

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“…Progress in the development of relevant technologies was made through efforts of many research teams worldwide: Ohl (1949), Jacobi (1951), Darlington (1952), Dummer (1952), Horowitz (1952), Pfann (1952), Johnson (1953, Sziklai (1953), Hockley (1954, Moyer (1954), Tarui (1957), Kilby (1958), Atalla (1959), Norman (1960), Hoerni (1962), Lehovec (1962), Sah (1988), Saxena (2009). The list of publications and overall development was analysed in details in the previously mentioned three articles of Gibbons and ten years later by (Fair 1998).…”

Section: Introductionmentioning

confidence: 99%

Towards Next-Generation Small-Size Boron Ion Implanting Apparatus

Blahins

Ūbelis

2022

Proceedings of the Latvian Academy of Sciences. Section B. Natural, Exact, and Applied Sciences.

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The article provides a brief insight in the history of ion implantation, paying special attention to boron ion implantation in high purity Germanium crystal, exclusively valuable in the production of highly effective sensors of high-energy radiation to detect photons in the range of megaelectron-volt or higher up to hard X-ray range. There is a need for small user-friendly implanters in response to urgent demand to scale up production of short wave sensors, which are in exclusive demand for various nuclear safety systems worldwide. Particularly, research driven “high tech” small and medium enterprises in Latvia are among the three leading worldwide producers of such sensors and systems. These SME provide instrumentation to the International Atomic Energy Agency, to the government of Singapore, to the government of Japan to facilitate dealing with nuclear waste management caused by the Fukushima disaster, and to the European Space Agency. The challenge is to find technology that allows the use of solid state boron as ion sources instead of its chemical compounds, which create too many technological difficulties in the beam forming process and in most cases are poisonous. The review of existing solutions points towards a possible breakthrough where hollow cathode plasma combined with radiofrequency inductive coupled plasma can be used to produce boron ions from elemental boron in sufficient quantity to form a high energy ion beam close to 100 kV. Based on the review, promising solutions are offered, the first results of relevant analytic and pilot experiments are analysed and the future experimental roadmap is discussed.

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Invention of Integrated Circuits - Untold Important Facts

Cited by 8 publications

References 13 publications

Interpretations of Innovation: The Role of Technology in Explanation Seeking Related to Psychosis

Interpretations of Innovation: The Role of Technology in Explanation Seeking Related to Psychosis

Introduction to the History of Semiconductors

Towards Next-Generation Small-Size Boron Ion Implanting Apparatus

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