Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Effect of Hydrogen Dilution on the Intrinsic a-Si:H Film of the Heterojunction Silicon-Based Solar Cell

“…Numerous deposition parameters control the quality of an i-a-Si:H layer. [4][5][6][7][8] The key considerations in setting the deposition parameters are the need to passivate the surface of a c-Si substrate; to prevent the initiation of the localized epitaxial growth at the a-Si:H/c-Si interface and to reduce the defects in a-Si:H films. 4,9,10 Hydrogen dilution of the silane gas mixture is extensively used in the deposition of a-Si:H films in thin film solar cells to improve performance and stability.…”

“…Kim et al pointed out that an R of 2-4 can effectively improve the efficiencies of p-type HJS solar cells compared to those without H 2 dilution. 6 More recently, Jeon et al and Dao et al used radio frequency PECVD and inductive coupled plasma CVD, respectively, to deposit a-Si:H films on c-Si substrates with various R. 7,8 The optimum R values to obtain the highest effective lifetime were very different (R ¼ 15 for Jeon et al and R ¼ 1 for Dao et al), perhaps because different deposition systems were used. Note that both groups studied the quality of the a-Si:H layer without the fabrication of HJS solar cells.…”

Amorphous Silicon Films and Nanocolumns Deposited on Sapphire and GaN by DC Sputtering

“…Amorphous Si thin films, which are typically fabricated by plasma-enhanced chemical vapor deposition (PECVD), are usually applied in advanced electronics devices such as highvoltage thin film transistors, [2,3] microelectromechanical systems (MEMS), [4] solar cell devices, [5,6] and passivation buffer layers. [7][8][9][10][11] On the contrary, investigations on a-Si nanocolumns, nanopillars, or nanoholes are undergoing. Kim et al [12] reported amorphous silicon on copper nanopillars electrodes; similarly, Lin et al [13] reported lithium fluoride-coated amorphous silicon nanocolumns for lithium-ion batteries.…”