Abstract:Sputtering is a deposition technique used to fabricate low‐cost silicon films on crystalline and amorphous substrates. Herein, the deposition of amorphous silicon films by DC sputtering on both sapphire and GaN/sapphire substrates is reported. Films are deposited using argon plasma with a pressure of 0.47 Pa at 30–60 W of DC power and different deposition temperatures from RT to 550 °C. The effect of different deposition conditions is investigated on structural quality, layer morphology, and optical properties… Show more
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