“…Nowadays, Si-based or GaSb-based devices have drawn enormous attentions in modern optoelectronic devices. − Particularly, Si-based photodetectors are compatible with mature microelectronics technology, which has been realized in mass production. At the same time, near-ultraviolet photodetectors are widely employed in ozone monitoring, solar radiation studies, atmospheric re-entry monitoring, environmental monitoring, national defense early warning, and so on. − However, due to the narrow-band-gap semiconductors and high reflection coefficient and shallow penetration depth of near-ultraviolet light, Si and GaSb are rarely employed for near-ultraviolet photodetection . Nowadays, many studies are attempting to adopt wide-band-gap semiconductor/Si heterojunction photodetectors to achieve ultraviolet photodetector. , Unfortunately, due to the visible light absorption and response of Si, the reported wide-band-gap semiconductor/Si heterojunction photodetectors exhibit poor ultraviolet selectivity, limiting the direct application in ultraviolet detection under a visible light background. − In this work, PbI 2 nanosheets are prepared directly on Si and GaSb wafers by a simple solution process to construct unipolar heterojunctions for near-ultraviolet photodetection.…”