2018
DOI: 10.1007/s10854-018-0404-3
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Integral nanoindentation evaluation of TiO2, SnO2, and ZnO thin films deposited via spray-pyrolysis on glass substrates

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Cited by 12 publications
(8 citation statements)
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“…The present H and E values were in a reasonable range compared with the previous studies [15,16,43]. Indeed, the of SnO 2 film (F/Sn = 0) was comparable with the H = 6.1 ± 0.1 GPa and E = 78.5 ± 0.4 GPa of SnO 2 films prepared by spray-pyrolysis [43]. Meanwhile, the H of 6.9–10.2 GPa and E of 115.1–131.7 GPa for the present FTO films were larger than H = 5.1 GPa and E = 71.1 GPa for FTO thin films deposited by chemical vapor deposition [16], and comparable with the H = 9.01 GPa and E = 125.24 GPa for the as-deposited FTO film prepared by APCVD [15].…”
Section: Resultssupporting
confidence: 89%
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“…The present H and E values were in a reasonable range compared with the previous studies [15,16,43]. Indeed, the of SnO 2 film (F/Sn = 0) was comparable with the H = 6.1 ± 0.1 GPa and E = 78.5 ± 0.4 GPa of SnO 2 films prepared by spray-pyrolysis [43]. Meanwhile, the H of 6.9–10.2 GPa and E of 115.1–131.7 GPa for the present FTO films were larger than H = 5.1 GPa and E = 71.1 GPa for FTO thin films deposited by chemical vapor deposition [16], and comparable with the H = 9.01 GPa and E = 125.24 GPa for the as-deposited FTO film prepared by APCVD [15].…”
Section: Resultssupporting
confidence: 89%
“…As shown in Figure 7a,b, the hardness of the FTO films deposited at F/Sn = 0, 0.1, 0.5, and 1.0 was 5.6 ± 0.2, 6.9 ± 0.3, 12.3 ± 0.4, and 10.2 ± 0.3 GPa, respectively, and the Young’s modulus for the corresponding films was 95.2 ± 7.1, 115.1 ± 8.7, 131.7 ± 8.0, and 120.6 ± 7.6 GPa, respectively. The present H and E values were in a reasonable range compared with the previous studies [15,16,43]. Indeed, the of SnO 2 film (F/Sn = 0) was comparable with the H = 6.1 ± 0.1 GPa and E = 78.5 ± 0.4 GPa of SnO 2 films prepared by spray-pyrolysis [43].…”
Section: Resultssupporting
confidence: 88%
“…To enhance material performance in such applications, the study of its elastic and optical properties is of paramount importance. In this sense, in the last decade many experimental investigations have addressed the different structural and optical properties of pure and doped ZnO systems [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18]. As a general remark, these investigations frequently report how the material band gap energy (E g ) and its elastic moduli depend on different parameters related to the processing method.…”
Section: Introductionmentioning
confidence: 99%
“…Consequently with the film thickness and grain size decrease, a clear increase of E as well as H is was observed. This generalized film strengthening (increase of the resistance to elastic ( E ) and plastic ( H ) strains) by reducing the thickness is a typical size effect observed in soft films on hard substrates [13][14][15][16][17][18][19][20][21][22][23][24][25]. In particular, this strengthening effect is intensified as the film thickness decreases because the effects of the mechanical properties mismatch at the film-to-substrate interface become stronger, and a more important influence of the substrate mechanical behavior on the sample effective response is achieved.…”
Section: Resultsmentioning
confidence: 99%
“…The mechanical properties of thin films can be different than the bulk material depending on the substrate mechanical properties and the film dimensions. Through history, many researchers have given several theoretical [13][14][15] and experimental [16][17][18][19][20][21][22][23][24][25] evidence of this phenomenon. To practical effects, it is generally accepted that for small indentation depths, the elastic modulus (less than 1% to 3% of the total film thickness) and indentation hardness (less than 15% to 10% of the total film thickness) of the films are not affected by the substrate.…”
Section: Introductionmentioning
confidence: 99%