1967
DOI: 10.1109/t-ed.1967.16103
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Instability in vacuum deposited silicon oxide

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Cited by 16 publications
(4 citation statements)
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“…Physics Abstracts 8.740 In many dielectrics a relaxation mechanism determines the dielectric properties [1]. Similar properties have also been observed on evaporated SiO dielectrics containing mobile ions [21 and measurements with diffèrent electrode materials indicate the existence of surface traps for these mobile ions [3]. In order to describe the dielectric properties, a theoretical model has been proposed in which the ions can relax between the traps located at the two electrodes [4].…”
Section: Classificationmentioning
confidence: 79%
“…Physics Abstracts 8.740 In many dielectrics a relaxation mechanism determines the dielectric properties [1]. Similar properties have also been observed on evaporated SiO dielectrics containing mobile ions [21 and measurements with diffèrent electrode materials indicate the existence of surface traps for these mobile ions [3]. In order to describe the dielectric properties, a theoretical model has been proposed in which the ions can relax between the traps located at the two electrodes [4].…”
Section: Classificationmentioning
confidence: 79%
“…OtOx (1) where j denotes the current carried by the mobile ions. With D the diffusion constant and # the mobility, we get for j:…”
Section: On ~Jmentioning
confidence: 99%
“…Thin dielectric layers obtained by vacuum evaporation or R. F. sputtering often show the presence of mobile ions [1], [2], [3], [4], [5]. This phenomenon leads to a Debye type polarisation mechanism [6].…”
Section: Introductionmentioning
confidence: 99%
“…When we apply a step voltage V across the capacitor, equation (3) combined with (4) to (6) and (7) can be solved analytically, because the electric field E =V/d (d thickness of the dielectric) is constant. The space-charge effect of the ions on the voltage distribution i s neglected.…”
mentioning
confidence: 99%