2017
DOI: 10.1002/admt.201700063
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Inkjet‐Printing: A New Fabrication Technology for Organic Transistors

Abstract: Inkjet-printing is one of the most important fabrication techniques in the field of printed electronics. Its main advantages include the possibility of fabricating, at ambient conditions and by employing a digital layout, a large variety of electronic devices on different types of substrates, including flexible plastic ones. In this paper, the utilization of inkjet-printing as an important fabrication tool for the realization of organic transistors and circuits/sensing systems based on such type of transistors… Show more

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Cited by 114 publications
(71 citation statements)
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“…[1][2][3][4][5] Such vision has begun to show concrete potential through a variety of proofof-concept demonstrations, among which are programmable logic circuitry for flexible displays, [6] transferrable electronics for pharmaceutics, [7] healthcare sensors for brainwave detection [8] or pulse oximetry, [9] fully printed washable electronics on fabrics, [10] and imperceptible logic circuitry on ultrathin substrates for intelligent electronic skin. This promise stemmed from the prospect of utilizing printing tools derived from well-established graphical arts technologies to deposit a variety of functional materials, which exhibit a suitable combination of mechanical and electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5] Such vision has begun to show concrete potential through a variety of proofof-concept demonstrations, among which are programmable logic circuitry for flexible displays, [6] transferrable electronics for pharmaceutics, [7] healthcare sensors for brainwave detection [8] or pulse oximetry, [9] fully printed washable electronics on fabrics, [10] and imperceptible logic circuitry on ultrathin substrates for intelligent electronic skin. This promise stemmed from the prospect of utilizing printing tools derived from well-established graphical arts technologies to deposit a variety of functional materials, which exhibit a suitable combination of mechanical and electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…A focused ion beam was proposed for bulk samples, however, protection of the membrane from the high‐energy ion beam is difficult. Deposition of small amounts of particles from a solution can include inkjet methods with droplet diameters in the range of tens of micrometers, which is too large for LCTEM chip modification . Atomic force microscopy (AFM) derived methods, such as dip pen nanolithography (DPN) are possible alternatives, capable of producing features on surfaces with dimensions in the nanometer range.…”
Section: Methodsmentioning
confidence: 99%
“…Deposition of small amounts of particles from a solution can include inkjet methods with droplet diameters in the range of tens of micrometers, which is too large for LCTEM chip modification. [13] Atomic force microscopy (AFM) derived methods, such as dip pen nanolithography (DPN) are possible alternatives, [14] capable of producing features on surfaces with dimensions in the nanometer range. However, the direct contact between the solid tip and the fragile glassy carbon electrode/Si 3 N 4 membrane can create damage.…”
mentioning
confidence: 99%
“…Ein fokussierter Ionenstrahl wurde für die Deposition von Proben vorgeschlagen, jedoch ist der Schutz der Membran vor dem hochenergetischen Ionenstrahl schwierig. Zur Abscheidung kleiner Mengen an Partikeln aus einer Lösung werden Tintenstrahlverfahren mit Tröpfchendurchmessern im Bereich von einigen zehn μm benutzt, was für eine LCTEM‐Chip‐Modifikation zu groß ist . Von der Rasterkraftmikroskopie (AFM) abgeleitete Methoden wie die Dip‐Pen‐Nanolithographie (DPN) sind mögliche Alternativen, die in der Lage sind, Strukturen auf Oberflächen mit Abmessungen im Nanometerbereich zu erzeugen.…”
Section: Methodsunclassified
“…Zur Abscheidung kleiner Mengen an Partikeln aus einer Lçsung werden Tintenstrahlverfahren mit Trçpfchendurchmessern im Bereich von einigen zehn mm benutzt, was für eine LCTEM-Chip-Modifikation zu groß ist. [13] Von der Rasterkraftmikroskopie (AFM) abgeleitete Methoden wie die Dip-Pen-Nanolithographie (DPN) sind mçgliche Alternativen, [14] die in der Lage sind, Strukturen auf Oberflächen mit Abmessungen im Nanometerbereich zu erzeugen. Allerdings kann der direkte Kontakt zwischen der festen Spitze und der zerbrechlichen Glaskohlenstoffelektrode/Si 3 N 4 -Membran Schäden verursachen.…”
unclassified