Inkjet-printed perovskite distributed feedback lasers

Mathies, Florian; Brenner, Philipp; Hernandez‐Sosa, Gerardo; Howard, Ian A.; Paetzold, Ulrich W.; Lemmer, Uli

doi:10.1364/oe.26.00a144

Cited by 68 publications

(71 citation statements)

References 38 publications

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“…Co-evaporated (single-cation absorber), spincoated (triple-cation absorber), and inkjet-printed (triple-cation absorber) solar cells with stable power output for 5 min and PCEs of up to 15.4%, 16.8%, and 18.5% are achieved, respectively (see Figure 4a). 2019, 9,1802995 previous section, increasing the absorber thickness while maintaining its quality is the key reason for this improvement. The PCEs achieved here belong to the highest values reported for vacuum-processed NiO x HTLs without additional doping (besides the intrinsic defect doping), thus highlighting the high quality of the electron beam evaporated NiO x layer.…”

Section: Nickel Oxide Hole Transport Layers For Efficient Perovskite-mentioning

confidence: 99%

“…[22,[72][73][74][75] It was shwon before that UV radiation degrades perovskite solar cells at the front side interface of the metal oxide charge transport material and the perovskite absorber layer. 2019, 9,1802995 [22,74,75] Titanium dioxide (TiO x ), in particular, exhibits strong UV degradation and is usually not recommended to be placed in front of the perovskite absorber without UV blocking layers.…”

Section: Robustness Of Nickel Oxide-based Solar Cells Under External mentioning

confidence: 99%

“…[1][2][3][4][5] Even though other optoelectronic devices like light emitting diodes and lasers are being researched, [6][7][8][9][10][11][12][13] perovskite-based photovoltaics (PV) is the key technology driving the fast emergence of perovskitebased optoelectronics. [1][2][3][4][5] Even though other optoelectronic devices like light emitting diodes and lasers are being researched, [6][7][8][9][10][11][12][13] perovskite-based photovoltaics (PV) is the key technology driving the fast emergence of perovskitebased optoelectronics.…”

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confidence: 99%

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Electron‐Beam‐Evaporated Nickel Oxide Hole Transport Layers for Perovskite‐Based Photovoltaics

Abzieher

Moghadamzadeh

Schackmar

et al. 2019

Advanced Energy Materials

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137

149

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application-oriented research like process engineering and upscaling is observed. [1][2][3][4][5] Even though other optoelectronic devices like light emitting diodes and lasers are being researched, [6][7][8][9][10][11][12][13] perovskite-based photovoltaics (PV) is the key technology driving the fast emergence of perovskitebased optoelectronics. Recently, power conversion efficiencies (PCEs) close to 24% were demonstrated for perovskite PV, exceeding the PCEs of established thinfilm technologies. [14] Despite the rapid progress in terms of PCE, one key challenge of perovskite-based PV is still its low stability under realistic outdoor stress conditions-temperature, humidity, and ultraviolet (UV) radiation. A significant advance toward more stable devices was demonstrated by engineering the composition of the large cation site of the perovskite crystal structure and by including low-dimensional perovskite interlayers and passivation layers. [15][16][17][18][19][20] Further advances in stability are based on the charge extracting materials and their interfaces with the perovskite absorber layers. [21][22][23] Most reported record PCEs are still based on highly expensive organic hole transport layer (HTL) materials like 2,2′,7,7′-tetrakis[N,N-di (4methoxyphenyl)amino]-9,9′-spirobifluorene (spiro-MeOTAD) or poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine] (PTAA). [20,24,25] Although these materials result in good performance on short High-quality charge carrier transport materials are of key importance for stable and efficient perovskite-based photovoltaics. This work reports on electron-beam-evaporated nickel oxide (NiO x ) layers, resulting in stable power conversion efficiencies (PCEs) of up to 18.5% when integrated into solar cells employing inkjet-printed perovskite absorbers. By adding oxygen as a process gas and optimizing the layer thickness, transparent and efficient NiOx hole transport layers (HTLs) are fabricated, exhibiting an average absorptance of only 1%. The versatility of the material is demonstrated for different absorber compositions and deposition techniques. As another highlight of this work, all-evaporated perovskite solar cells employing an inorganic NiO x HTL are presented, achieving stable PCEs of up to 15.4%. Along with good PCEs, devices with electron-beam-evaporated NiO x show improved stability under realistic operating conditions with negligible degradation after 40 h of maximum power point tracking at 75 °C. Additionally, a strong improvement in device stability under ultraviolet radiation is found if compared to conventional perovskite solar cell architectures employing other metal oxide charge transport layers (e.g., titanium dioxide). Finally, an all-evaporated perovskite solar mini-module with a NiO x HTL is presented, reaching a PCE of 12.4% on an active device area of 2.3 cm 2 .

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Section: Nickel Oxide Hole Transport Layers For Efficient Perovskite-mentioning

confidence: 99%

Section: Robustness Of Nickel Oxide-based Solar Cells Under External mentioning

confidence: 99%

mentioning

confidence: 99%

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Electron‐Beam‐Evaporated Nickel Oxide Hole Transport Layers for Perovskite‐Based Photovoltaics

Abzieher

Moghadamzadeh

Schackmar

et al. 2019

Advanced Energy Materials

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137

149

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“…The output intensity sharply increased when the pump energy reached 227.7 μJ cm −2 , which stands for the fluence threshold for laser action. This value is comparable to other DFB laser thresholds based on the solution‐processing MAPbI 3 from some previous studies using similar methods …”

Section: Processing Details and Summary Of The Key Ase Performance Pamentioning

confidence: 99%

Facile and Controllable Fabrication of High‐Performance Methylammonium Lead Triiodide Films Using Lead Acetate Precursor for Low‐Threshold Amplified Spontaneous Emission and Distributed‐Feedback Lasers

Zhang

Sun

Zhang

et al. 2019

Physica Rapid Research Ltrs

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Organic–inorganic lead halide perovskites have emerged rapidly as the most attractive materials for photovoltaics in the last 10 years. Intense research has been done on crystal growth and morphology control to improve their power conversion efficiencies. Furthermore, perovskites also show great potential for optical amplification and lasing. Despite the numerous reports on how processing conditions affect the perovskite light‐harvesting properties, effects on amplified spontaneous emission (ASE) or lasing performance have attracted considerably less attention. Herein, a detailed study on the ASE performance of methylammonium lead triiodide (MAPbI3) films, processed with lead acetate (Pb(Ac)2) as lead source following a one‐step spin‐coating method and exposed to different post‐deposition conditions, is presented. It is found that the use of Pb(Ac)2 instead of lead iodide (PbI2) accelerates the crystal growth and simplifies the fabrication procedure. Even very thin MAPbI3 films (≈70 nm) can sufficiently support optical amplification and lasing in surface‐emitting distributed‐feedback (DFB) cavities. The facile and highly controllable MAPbI3 film formation observed with Pb(Ac)2 as precursor makes it a preferred choice with respect to PbI2 for future perovskite laser diodes.

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“…Due to their promising electronic and optical properties, tremendous progress has been made in the performance of perovskites solar cells. [6,7] Such films have been incorporated into a variety of optical cavities, including whispering gallery mode cavities, [5,[8][9][10] vertical cavities, [4,11] distributed feedback (DFB) cavities, [12][13][14][15][16] and photonic crystal cavities. [3][4][5] Simple, solution-based fabrication of perovskites allows the fabrication of thin films, which exhibits optical gain within a wide spectral range.…”

Section: Introductionmentioning

confidence: 99%

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Bar‐On

Brenner

Lemmer

et al. 2018

Adv Materials Technologies

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description of the efforts on developing perovskite lasers is given in recent review articles. [19][20][21][22] As the field advances, new approaches for patterning perovskite films are becoming essential. More specifically, a lithographic approach that can define desired perovskite patterns is highly needed in order to utilize these materials for the realization of integrated perovskite photonic devices. Generally speaking, effective lithographic patterning requires three main capabilities. First, the ability to cover the material (in our case perovskites) with a layer of resist and pattern it with sub-micrometer resolution using a scalable process. Second, employment of the patterned resist as an etch mask for complete removal of the unprotected perovskite film. Third, removal of the residual resist mask from the perovskite film. Since metal halide perovskites are unstable soluble materials that are sensitive to a variety of solvents and gases, [23] accomplishing all of the above steps without damaging the film is highly challenging. During the past few years, several attempts have been made in order to address this challenge. Lyashenko et al. [24] demonstrated the ability to pattern perovskites using photolithography followed by SF 6 etching. This approach was utilized to define patterns in photoresists on top of methyl-ammonium lead iodide (MAPbI 3 ) films but was limited to micrometer scale features due to diffraction effects in photolithography. In addition, the chemical reaction that was used in order to etch the material only modified the exposed areas chemically (converting the material to PbF 2 ) and did not remove the perovskite layer completely as desired from a proper etching technique. Zhang et al. [25] demonstrated a different approach where PMMA layers were deposited on top of a MAPbBr 3 film and patterned using electron beam lithography (EBL) followed by dry Cl etching. Although this method can potentially generate sub-micrometer features, it is based on a serial patterning technique (EBL) and is thus limited in terms of speed and cost. In addition, the scanning electron microscopy (SEM) images of the patterned surface suggest that the etching process left a residual layer on the surface (possibly PbCl 2 ) and was unable to remove the perovskite completely. A slightly different approach to pattern perovskite films, involving lift-off instead of etching, was recently successfully demonstrated. [26] However, this technique necessitates the evaporation of perovskite films and is not compatible with the standard spin-coating film preparation method which is simple, inexpensive, and renders these materials A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by cha...

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Inkjet-printed perovskite distributed feedback lasers

Cited by 68 publications

References 38 publications

Electron‐Beam‐Evaporated Nickel Oxide Hole Transport Layers for Perovskite‐Based Photovoltaics

Electron‐Beam‐Evaporated Nickel Oxide Hole Transport Layers for Perovskite‐Based Photovoltaics

Facile and Controllable Fabrication of High‐Performance Methylammonium Lead Triiodide Films Using Lead Acetate Precursor for Low‐Threshold Amplified Spontaneous Emission and Distributed‐Feedback Lasers

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

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