Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Ahn, Jungkyu; Jeon, Sanghyun; Woo, Ho Kun; Bang, Junsung; Lee, Yong Min; Neuhaus, Steven J.; Lee, Woo Seok; Park, Taesung; Lee, Sang Yeop; Jung, Byung Ku; Joh, Hyungmok; Seong, Mingi; Choi, Jong Bo; Yoon, Ho Gyu; Kagan, Cherie R.; Oh, Soong Ju

doi:10.1021/acsnano.1c04772

Cited by 28 publications

(23 citation statements)

References 49 publications

(69 reference statements)

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“…This is because QDs are easily dissolved or washed with organic solvents, which are also used to dissolve the photoresist. Thus, alternative patterning methods, such as inkjet [15][16][17][18][19] and transfer printing, [20][21][22] have been employed to form multicolor QD patterns. However, inkjet printing has a limited tact time and suffers from nozzle clogging issues for industrial applications.…”

mentioning

confidence: 99%

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Lee

Kim

Han

et al. 2022

Adv Materials Inter

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materials because of their high color purity, large-scale solution processability, and tunable electrical and optical properties. [1][2][3] The InP-based QDs have been synthesized with near-unity photoluminescence quantum yield (PL QY), which can meet the RoHS requirements by removing toxic Cd from QD emitters. [4,5] Despite recent advances in QD light-emitting diodes (QD-LEDs), including a 20% external quantum efficiency and enhanced device lifetime, [4,[6][7][8][9][10][11] multicolored and pixelated QD-LED devices still need to be developed. [12] The QDs are typically synthesized using wet chemistry, which is useful for large-scale solution processes. When QDs are incorporated into a device structure and sandwiched into a multilayered thin film, solvent orthogonality should be considered because the pre-coated QD layer can be damaged by the solvent in the top layers. This can be a serious issue when the QD film is patterned as a pixelated display, where conventional photolithography cannot be used. [13,14] When photoresists are coated on top of the pre-existing QD film, the QD film is easily removed, or the two layers intermix. This is because QDs are easily dissolved or washed with organic solvents, which are also used to dissolve the photoresist. Thus, alternative patterning methods, such as inkjet [15][16][17][18][19] and transfer printing, [20][21][22] have been employed to form multicolor QD patterns. However, inkjet printing has a limited tact time and suffers from nozzle clogging issues for industrial applications. [15,23] In addition, transfer printing can yield high-resolution patterns, but the process requires precise control of kinetic parameters, such as pick-up and peeling speed, which limits the reproducibility of the process. [21,22] Therefore, it is highly desirable to use conventional photolithography for patterning QD films. [24] Two methods have been suggested for employing photolithography to QD film patterning. One is the addition of light-sensitive cross-linking molecules to the QD solution. The molecule can either replace the original ligands or can be included as an additional substance. [25][26][27] Upon light exposure, the molecules form a crosslinked structure between the QDs, and the patterns can be formed by solvent dipping. The other method directly uses a conventional photoresist because it is a well-designed chemical that provides high resolution and etch-resistance. Owing to the absence of solvent resistance in QD films, the lift-off method Colloidal quantum dot-based light-emitting diodes (QD-LEDs) are one of the potential future self-emissive displays owing to their large-scale solutionprocessibility and high color purity. For the industrial application of QD-LEDs, high-performance QD-LED and high-resolution patterning of quantum dot (QD) films are required. Photolithography is an ideal tool for patterning QD films. Previously, the high-resolution patterning of QD films using direct photolithography by ultra-thin atomic layer deposition of ZnO on the QD surface is reported. Th...

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confidence: 99%

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Lee

Kim

Han

et al. 2022

Adv Materials Inter

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“…Advanced Materials, 15 (21), 1862-1866. 35 Pradhan, S., Di Stasio, F., Bi, Y., Gupta, S., Chirstodoulou, S., Stavrinadis, A., & Konstantatos, G. (2019). High-efficiency colloidal quantum dot infrared light-emitting diodes via engineering at the supra-nanocrystalline level.…”

Section: Discussionmentioning

confidence: 99%

“…Using this approach, both record-high EQE and maximum radiance have been reported in the literature. Currently, there are two kinds of host-guest EMLs: QDs-in-QDs 35 and QDs-in-perovskite. [36][37][38] The first one combines large band gap PbS CQDs and ZnO NCs as the matrix and uniformly embeds small band gap IR-emitting PbS QDs into this nanoparticle guest environment.…”

Section: Infrared Qledsmentioning

confidence: 99%

“…Ligand exchange with short chain molecules also was performed to improve the charge diffusion length in the EML film, where the ZnO NCs and PbS CQDs in the matrix are responsible for the electron and hole transport, respectively. 35 Another synergistic role of the ZnO NCs is to remotely passivate electron traps on the PbS CQD IR-emitters. This QD-in-QD emissive CQD EML layer design led to high device performance with high radiance.…”

Section: Infrared Qledsmentioning

confidence: 99%

“…28 To further build functional devices or more complicated circuitry, however, the QD films and metal contacts need to be patterned and integrated with dielectric and gate layers, as shown in Figure 1b and c. A handful of approaches have been reported in the literature to create patterned QD layers, such as through conventional photolithography, 29,30 direct optical lithography, 28 microcontact printing, 31,32 and inkjet printing, [33][34][35] but only a few examples have achieved QD flexible circuitry by using these methods.…”

Section: Solution-processible Colloidal Quantum Dotsmentioning

confidence: 99%

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Vitamins as Active Agents for Highly Emissive and Stable Nanostructured Halide Perovskite Inks and 3D Composites Fabricated by Additive Manufacturing

Recalde

Gualdrón‐Reyes

Echeverría‐Arrondo

et al. 2022

Adv Funct Materials

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The use of non-toxic and low-cost vitamins like α-tocopherol (α-TCP, vitamin E) to improve the photophysical properties and stability of perovskite nanocrystals (PNCs), through post-synthetic ligand surface passivation, is demonstrated for the first time. Especially interesting is its effect on CsPbI 3 the most unstable inorganic PNC. Adding α-TCP produces that the photoluminescence quantum yield (PLQY) of freshly prepared and aged PNCs achieves values of ≈98% and 100%, respectively. After storing 2 months under ambient air and 60% relative humidity, PLQY is maintained at 85% and 67%, respectively. α-TCP restores the PL features of aged CsPbI 3 PNCs, and mediates the radiative recombination channels by reducing surface defects. In addition, the combination of α-TCP and PNCs facilitates the chemical formulation to prepare PNCs-acrylic polymer composites processable by additive manufacturing. This enables the development of complex shaped parts with improved luminescent features and long-term stability for 4 months, which is not possible for non-modified PNCs. A PLQY ≈92% is reached in the 3D printed polymer/PNC composite, the highest value obtained for a red-emitting composite solid until now as far as it is known. The passivation shell provided by α-TCP makes that PNCs inks do not suffer any degradation process avoiding the contact with the environment and preserve their properties after reacting with polar monomers during composite polymerization.

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Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films

Cited by 28 publications

References 49 publications

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Complete Issue

Vitamins as Active Agents for Highly Emissive and Stable Nanostructured Halide Perovskite Inks and 3D Composites Fabricated by Additive Manufacturing

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