2018
DOI: 10.1039/c8cp00210j
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Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface: a DFT study

Abstract: In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as the co-reagent on a SiO2(0001) surface by means of density functional theory (DFT). All dominant reaction pathways from the early stage of adsorption of each ALD reagent to the formation of bulk-like Mo and S at the surface are identified. In the metal pulse, proton transfer from terminal OH groups on the SiO2 to the physisorbed metal precursor increases the… Show more

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Cited by 18 publications
(14 citation statements)
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“…A complete list of ALD reactions of the amide precursor can be found in previous studies. 6062 In this study, we only looked at the adsorption energy of the W precursor and the consequence of ligand protonation on the adsorption of the W precursor.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…A complete list of ALD reactions of the amide precursor can be found in previous studies. 6062 In this study, we only looked at the adsorption energy of the W precursor and the consequence of ligand protonation on the adsorption of the W precursor.…”
Section: Methodsmentioning
confidence: 99%
“…More computational details can be found in a previous work. 60 In principle, the following ALD reactions are included: adsorption, protonation of ligands, desorption of the protonated ligands, densification, cooperative effects, and ligand exchange. A complete list of ALD reactions of the amide precursor can be found in previous studies.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…However, with typical substrates that contain dangling bonds, such as SiO 2 , formation of covalent bonds and therefore an interlayer between the substrate and TMDC seems likely and is also supported by theoretical studies. [132,133] All of the abovementioned factors affect the resulting morphology of ALD TMDC films. Furthermore, it is often observed that in the beginning of the film growth, very thin ALD TMDC films are smooth.…”
Section: Specialties In the Atomic Layer Deposition Of 2d Materialsmentioning
confidence: 99%
“…However, with typical substrates that contain dangling bonds, such as SiO 2 , formation of covalent bonds and therefore an interlayer between the substrate and TMDC seems likely and is also supported by theoretical studies. [ 132,133 ]…”
Section: Atomic Layer Deposition Of 2d Metal Dichalcogenidesmentioning
confidence: 99%
“…This kind of databases will be the standard reference for the future research. In computational chemistry, the various DFT methods have been implemented and studied in several systems including chemosensor [22,23], hydrogen evolution reaction (HER) [24][25][26], oxygen reduction reaction (ORR) [27,28], oxygen evolution reaction (OER) [29], molecular machines [30,31], DNA mutation [32][33][34], selective etching [35,36], atomic layer deposition (ALD) [37,38] etc. Although a number of applications of DFT were reported, this book chapter precisely focused on heavy metal sensor and hydrogen evolution reaction.…”
Section: Introductionmentioning
confidence: 99%