Infrared Spectra and Structures of <scp>SiH2</scp>–(<scp>CH2</scp>)2 and <scp>CH2</scp><scp>CH</scp>−<scp>SiH3</scp> Intermediates Prepared in Reactions of Laser‐ablated Silicon Atoms with Ethane

Cho, Han‐Gook; Andrews, Lester

doi:10.1002/bkcs.10690

Cited by 6 publications

(1 citation statement)

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“…Silirane itself, previously undetected, has recently been made by the reaction of Si atoms with C 2 H 6 in low-temperature matrix isolation studies, but not via the reaction of SiH 2 with C 2 H 4 . The addition process has been the subject of several theoretical studies, − which support the idea of a virtually barrierless process.…”

Section: Introductionmentioning

confidence: 99%

Time-Resolved Gas-Phase Kinetic Study of SiD₂ + C₂H₄

Al-Rubaiey

Walsh

2018

J. Phys. Chem. A

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Time-resolved investigation of deuterium-substituted silylene (SiD) generated by laser flash photolysis of deuterium-substituted phenylsilane (PhSiD) was carried out to obtain rate constants for its bimolecular reaction with ethylene (CH). The reaction was studied in the gas phase over the pressure range of 1-100 Torr (in SF bath gas) at 295 K. The rate constants for SiD + CH were found to be independent of pressure and close in magnitude to the rate constants for the reaction of SiH + CH at the high-pressure limit. They are consistent with a rapid isotopic scrambling mechanism similar to that of SiH + CD. While silirane, the main product produced from this reaction, was too labile to be detected, vinylsilane, another possible product, was ruled out by gas chromatography analysis. This reaction shows similarities to those of SiH + H and its isotopic counterparts.

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