Infrared semiconductor laser irradiation used for crystallization of silicon thin films

Sameshima, Toshiyuki; Hasumi, Masahiko

doi:10.1016/j.jnoncrysol.2011.12.030

Cited by 1 publication

(1 citation statement)

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“…Recent study utilized near‐IR laser irradiation for a‐Si films crystallization . Depositing a highly extinctive in IR range film on top of a‐Si is one of possible approaches that was reported using diamond‐like carbon nanotubes coating for LIC process . In this work, Ni is proposed as such near IR range adsorbing material.…”

Section: Introductionmentioning

confidence: 62%

Scalable Approach for Amorphous Thin Silicon Films Near‐IR Laser‐Induced Crystallization Using Nickel Absorption Layer

Serdobintsev

Kozhevnikov

Starodubov

et al. 2019

Physica Status Solidi (a)

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Technology for thin polycrystalline silicon films preparation is crucial for development of novel semiconductor devices, including flexible electronics. A method for thin polycrystalline silicon film preparation utilizing deposited nickel absorption layer which allows use of inexpensive 1064 nm pulsed YAG: Nd laser for laser annealing of magnetron-sputtered amorphous silicon is reported here. Film morphology changes are visualized with scanning electron microscopy, its chemical composition and Ni fate upon laser irradiation are studied using X-ray energy dispersion analysis and secondary ion mass spectrometry. Silicon crystalline structure changes and its homogeneity are characterized using Raman spectroscopy utilizing mapped spectral measurements. Range of laser radiation energy fluence (J cm À2 ) is established which allowed for preparation of fully polycrystalline silicon film with crystalline silicon Raman peak position and width comparable to that of single-crystalline material. Nickel film is found to ablate substantially upon irradiation, leaving remains that can be easily removed by chemical etching.

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Section: Introductionmentioning

confidence: 62%