Infrared Reflection Spectroscopy of Polycyanurate Thin Films on Solids–State of the Interphase

Silane Deposition via Gas-Phase Evaporation and High-Resolution Surface Characterization of the Ultrathin Siloxane Coatings

“…Three siloxane particle types were formed in a sol–gel reaction with H 3 PO 4 as a catalyst. ,,, The materials were analyzed in the isotropic bulk liquid with FTIR–ATR, and the resulting spectra of APS (Figure a,b), GPS (Figure c,d), and FOS (Figure e,f) are shown.…”

“…The FTIR spectroscopy in ATR configuration using a ZnSe crystal allowed us to characterize the siloxane particle formation process inside the isotropic liquid material (Figure a) and the FTIR spectroscopy in ERA configuration followed the bond formation during the siloxane thin-film deposition process. The latter one, however, needed a 200 nm copper layer as a reflective coating on the substrates (Figure b). ,,− Therefore, these thin films were formed on CuO surfaces and a comparison to the siloxane formation on the Si/SiO 2 wafers should be discussed with care.…”

“…In this study, we used different, high-precision surface characterization methods complementing each other to ascertain the physico-chemical properties of the siloxane surfaces. For this purpose, atomic force microscopy (AFM), spectroscopic ellipsometry ,, (SE), Fourier transform infrared external reflection absorption spectroscopy (FTIR–ERAS), − Fourier transform infrared attenuated total reflection (FTIR–ATR) spectroscopy and dynamic contact angle (CA) − measurements were performed to control the individual steps of the process and to characterize the produced siloxane coatings. Additional focus was set on the investigation of the influence of the different reactions and of the leaving group ability from the silanes APTES, GPTMS, and FOTCS.…”

The Adhesion of Maleic Anhydride on Native Aluminum Oxide: An Approach by Infrared Spectroscopy and Quantum Mechanical Modeling

“…Adhesion of Maleic Anhydride 785 interference patterns that are produced by multiple re¯ections= refraction of light at the ®lm surface and at the interface with the substrate (see, e.g., [11,12,13]). Any additional structure in the ®lm (islands, porosity, structure gradients, etc.)…”

“…Therefore, we see that the free carbonyl stretch in model 3 is inclined by about 30 with respect to the oxide surface normal. The combined stretching vibration is almost perpendicular (12 ) to the oxide surface. From the modeling point of view (Table 3), the nonbonded carboxylic acid groups can be assessed almost directly by the IR bands j (model 3) and k (model 5).…”