Measurements of both the trapped charge density in the fast states and the surface recombination velocity as a function of the surface potential are reported for ethylated germanium surfaces. Measurements have been made at room temperature on n‐ and p‐type wafers. The surface potential was varied over a range of 0.15v by the application of an a‐c electric field normal to the surface. In the region of surface potentials examined, the charge distribution can be approximated by two discrete sets of surface states. The surface formed by ethylation have a concentration of fast states of the order of
5×1011 cm−2
. On n‐type material a strong p‐type inversion layer is formed; on p‐type material the bands are nearly flat at the surface. Ethylated samples have also been examined by the large signal surface photo‐voltage technique and by observation of the slow states conductivity relaxation. Measurements on several samples and repeated measurements on the same sample in a series of different gaseous ambients show the surface structure to be reproducible, stable, and insensitive to ambients.