2009
DOI: 10.1016/j.jnucmat.2008.11.030
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Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method

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Cited by 15 publications
(15 citation statements)
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“…Polished stainless steel disks with a 25 mm in diameter served as substrates. In order to obtain good adherence and good compactness of the films, the substrates were negatively biased at À750 V [8]. In this way energetic ions from both Be and W plasmas were accelerated toward the substrate.…”
Section: Experiments -Sample Preparation and Pisces B Deuterium Plasmamentioning
confidence: 99%
“…Polished stainless steel disks with a 25 mm in diameter served as substrates. In order to obtain good adherence and good compactness of the films, the substrates were negatively biased at À750 V [8]. In this way energetic ions from both Be and W plasmas were accelerated toward the substrate.…”
Section: Experiments -Sample Preparation and Pisces B Deuterium Plasmamentioning
confidence: 99%
“…The method is called thermionic vacuum arc (TVA) [3]. The principle of this method is the ignition of the plasma in pure vapors of the During the entire coating process, a negative bias voltage was applied on the tiles, with a value of -700V, which ensured a compact coating by rejecting the electrons and accelerating the positive ions from plasma [4].…”
Section: Methodsmentioning
confidence: 99%
“…For RBS measurements it had been used a 4 He energy beam of 2.6 MeV. The beam's energy value was chosen taking into account the interaction cross section of 4 He and beryllium to avoid the non-Rutherford interaction that may cause errors in the data interpretation.…”
Section: Methodsmentioning
confidence: 99%
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