Beryllium thin films deposited by thermionic vacuum arc for nuclear applications

Tiron, Vasile; Poroşnicu, C.; Dincă, P.; Velicu, Ioana–Laura; Cristea, Daniel; Munteanu, Daniel; Révész, Ádám; Stoian, George; Lungu, C.P.

doi:10.1016/j.apsusc.2019.03.096

Cited by 7 publications

(8 citation statements)

References 30 publications

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“…An important feature of the thermionic arc is that the plasma bulk is highly positive (hundreds of V to 1 kV), so that the metal ions will be accelerated towards the growing film with energy corresponding to the potential drop between the plasma potential and substrate potential [49,50]. An extensive description of experimental setup (excepting vacuum vessel size) and plasma diagnostics techniques are given in our previous paper [44]. In this work, all the experiments were performed in an ultra-high vacuum stainless-steel chamber with cylindrical shape (30 cm in diameter and 50 cm height).…”

Section: Photocatalyst Synthesismentioning

confidence: 99%

“…For example, the TVA is a gas-free plasma source with ion energy and flux that can be easily controlled by operating parameters [43]. Apart from the fact that the TVA-deposition method is an environmentally friendly, time-saving, cost-effective and facile PVD technology, the definite advantages are the high deposition rates, high purity of the thin films and good adhesion of the coating to the substrate [44]. In addition, by using ZnO thin films [45] or by loading the ZnO particles on a suitable substrate [23,46,47], the need for post-treatment steps to recover or remove the suspended particles from the treated water is avoided.…”

Section: Introductionmentioning

confidence: 99%

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Efficient Removal of Methylene Blue and Ciprofloxacin from Aqueous Solution Using Flower-like, Nanostructured ZnO Coating under UV Irradiation

et al. 2022

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Flower-like ZnO architectures assembled with many nanorods were successfully synthesized through Thermionic Vacuum Arc, operated both in direct current (DC-TVA) and a pulsed mode (PTVA), and coupled with annealing in an oxygen atmosphere. The prepared coatings were analysed by scanning-electron microscopy with energy-dispersive X-ray-spectroscopy (SEM-EDX), X-ray-diffraction (XRD), and photoluminescence (PL) measurements. By simply modifying the TVA operation mode, the morphology and uniformity of ZnO nanorods can be tuned. The photocatalytic performance of synthesized nanostructured ZnO coatings was measured by the degradation of methylene-blue (MB) dye and ciprofloxacin (Cipro) antibiotic. The ZnO (PTVA) showed enhancing results regarding the photodegradation of target contaminants. About 96% of MB molecules were removed within 60 min of UV irradiation, with a rate constant of 0.058 min−1, which is almost nine times higher than the value of ZnO (DC-TVA). As well, ZnO (PTVA) presented superior photocatalytic activity towards the decomposition of Cipro, after 240 min of irradiation, yielding 96% degradation efficiency. Moreover, the agar-well diffusion assay performance against both Gram-positive and Gram-negative bacteria confirms the degradation of antibiotic molecules by the UV/ZnO (PTVA) approach, without the formation of secondary hazardous products during the photocatalysis process. Repeated cyclic usage of coatings revealed excellent reusability and operational stability.

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Section: Photocatalyst Synthesismentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Efficient Removal of Methylene Blue and Ciprofloxacin from Aqueous Solution Using Flower-like, Nanostructured ZnO Coating under UV Irradiation

et al. 2022

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“…Considering the influence of the substrate which might affect the results, due to the indentation depth being larger than 10% of the film thickness, the changes in hardness behavior were reported to the SS substrate. The indenter imprint depth (D) and the thickness (T) of the deposited samples must satisfy D < T [52]. For a Vickers indenter, D can be expressed as D ≈ d/7, where d represents the mean value of the imprint diagonals.…”

Section: Mechanical Characterizationmentioning

confidence: 99%

Deposition, Morphological, and Mechanical Evaluation of W and Be-Al2O3 and Er2O3 Co-Sputtered Films in Comparison with Pure Oxides

et al. 2021

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Compact and defect-free high melting point oxide strengthened metallic matrix configurations are promising to resolve the hydrogen permeation and brittleness issues relevant to the fusion research community. Previous studies on oxide addition to metallic matrix demonstrated a mitigation in brittleness behavior, while deposition techniques and material configurations are still to be investigated. Thus, here, we report the structural, morphological, and mechanical characterization of metal-oxides thin layers co-deposited by radio frequency (RF)and direct current (DC) magnetron sputtering. A total of six configurations were deposited such as single thin layers of oxides (Al2O3, Er2O3) and co-deposition configurations as metal-oxides (W, Be)—(Al2O3, Er2O3). The study of films roughness by atomic force microscopy (AFM) method show that for Al2O3 metallic-oxides is increased to an extent that could favor gaseous trapping, while co-depositions with Be seem to promote an increased roughness and defects formation probability compared to W co-depositions. Lower elastic modulus on metal-oxide co-depositions was observed, while the indentation hardness increased for Be and decreased for W matrix configurations. These outputs are highly relevant for choosing the proper compact and trap-free configuration that could be categorized as a permeation barrier for hydrogen and furtherly studied in laborious permeation yield campaigns.

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“…The situation is even more complicated by the fact that the difference between the "true" plasma potential and the floating potential of an emissive probe is influenced by the plasma potential fluctuations, see e.g., [75,76]. On the other hand, even when burdened by some inaccuracy, the emissive probe yields important data for optimization of a particular TVA deposition process, e.g., [77].…”

Section: Langmuir/emissive/heated Probe Measurementsmentioning

confidence: 99%

“…The IEDF measurement proceeds therefore not by measurement of a continuous current as in the RFA, but by registering the pulses from individual ions when changing step-wise the voltage between segments. An example of IEDF measurements of Be + ions by an energy-resolved mass spectrometer presents the work in [77].…”

Section: Mass-spectrometry Ion Energy Analysismentioning

confidence: 99%

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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Beryllium thin films deposited by thermionic vacuum arc for nuclear applications

Cited by 7 publications

References 30 publications

Efficient Removal of Methylene Blue and Ciprofloxacin from Aqueous Solution Using Flower-like, Nanostructured ZnO Coating under UV Irradiation

Efficient Removal of Methylene Blue and Ciprofloxacin from Aqueous Solution Using Flower-like, Nanostructured ZnO Coating under UV Irradiation

Deposition, Morphological, and Mechanical Evaluation of W and Be-Al2O3 and Er2O3 Co-Sputtered Films in Comparison with Pure Oxides

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

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