2013
DOI: 10.1002/masy.201350508
|View full text |Cite
|
Sign up to set email alerts
|

Influence of Temperature and Type of Solvents on the Microdomain Orientation ofPSbP2VPUltrathin Films by Solvent Annealing

Abstract: Summary The effect of temperature and type of solvent on the microdomain orientation during solvent‐annealing of block copolymer ultrathin films on silicon substrates was investigated using asymmetric polystyrene‐block‐poly(2‐vinylpyridine) (PS‐b‐P2VP) diblock copolymer. When the solvent‐annealing was performed with THF at 20°C, the ultrathin film exhibited a mixed orientation of cylinders parallel and perpendicular to the substrate while at 25°C only parallel cylinders were observed by AFM. The solvent anneal… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
7
0

Year Published

2014
2014
2023
2023

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(7 citation statements)
references
References 55 publications
0
7
0
Order By: Relevance
“…Generally, preferentially wetting of one block at the substrate surface or free surface on the contrary induces preferential parallel orientation of domains [ 22 ]. For example, Hasegawa et al showed that the use of nonselective tetrahydrofuran (THF), selective solvent acetone for P2VP domain, or selective solvent toluene for the PS domain in the annealing of thin films PS- b -P2VP could cause the BCP to form significantly different morphologies, further asserting that various perpendicular structures can be formed predominantly on the substrates with the proper choice of solvent [ 23 , 24 ]. In addition to the interfacial interaction greatly influenced by the solvent vapor in SVA systems, the thickness of BCP films also affects the orientation of domains [ 20 , 21 , 22 , 25 ].…”
Section: Introductionmentioning
confidence: 99%
“…Generally, preferentially wetting of one block at the substrate surface or free surface on the contrary induces preferential parallel orientation of domains [ 22 ]. For example, Hasegawa et al showed that the use of nonselective tetrahydrofuran (THF), selective solvent acetone for P2VP domain, or selective solvent toluene for the PS domain in the annealing of thin films PS- b -P2VP could cause the BCP to form significantly different morphologies, further asserting that various perpendicular structures can be formed predominantly on the substrates with the proper choice of solvent [ 23 , 24 ]. In addition to the interfacial interaction greatly influenced by the solvent vapor in SVA systems, the thickness of BCP films also affects the orientation of domains [ 20 , 21 , 22 , 25 ].…”
Section: Introductionmentioning
confidence: 99%
“…The sufficient mobility and the solvated lamellar micro‐domains lead to self‐assembly from disordered lamellar micro‐domains to long‐range ordered lamellar structure. [ 29,35–37 ]…”
Section: Introductionmentioning
confidence: 99%
“…The sufficient mobility and the solvated lamellar micro-domains lead to self-assembly from disordered lamellar micro-domains to long-range ordered lamellar structure. [29,[35][36][37] The gorgeous skin colors of cephalopods, comprised of pigment colors and structural colors, provide a new approach to tackle the limited color control in electrochromic materials. Here we show for the first time that color changes throughout a wide visible region can be realized, by a combination of the electrochromic thin film [38] and the structurally colored thin film under a small electrical bias.…”
Section: Introductionmentioning
confidence: 99%
“…Many orientation control strategies for generating perpendicularly oriented BCP domains have been implemented with high- BCPs. For example, solvent vapor annealing has been used for orientation control of PS-b-PEO [3], PS-b-PDMS [4], PS-b-P2VP [5], PLA-b-PTMSS [6] and PMS-b-PHOST [7]. Introducing a solvent vapor chamber and kinetics of solvent vapor annealing may complicate DSA processing.…”
Section: Introductionmentioning
confidence: 99%