Influence of technological parameters on the mechanical properties of titanium nitride films deposited by hot target reactive sputtering

Dual-Function Electron-Conductive, Hole-Blocking Titanium Nitride Contacts for Efficient Silicon Solar Cells

“…Hall effect measurements indicate that the as-deposited TiN film behaves as an n-type semiconductor, with a very high conductivity of 1.6 3 10 3 S.cm À1 , an ultrahigh electron concentration of 1.3 3 10 23 cm À3 , and an electron mobility of 0.15 cm 2 .V À1 .s À1 . The high conductivity of TiN films with a high electron concentration can be attributed to the existence of metallic bonding with the d electrons of titanium, as described by Solovan et al24 The X-ray diffraction (XRD) pattern of as-deposited film exhibits strongly pronounced 2q peaks at 36.7 , 42.6 , and 61.8 (see FigureS1), indicating a face-centered cubic TiN phase (PDF-01-087-0630) with a preferred orientation of (111) planes 25,26. No 2q peaks related to metallic Ti ($38.5 ) are observed.…”

“…The high conductivity of TiN films with a high electron concentration can be attributed to the existence of metallic bonding with the d electrons of titanium, as described by Solovan et al 24 The X-ray diffraction (XRD) pattern of as-deposited film exhibits strongly pronounced 2q peaks at 36.7 , 42.6 , and 61.8 (see Figure S1), indicating a face-centered cubic TiN phase (PDF-01-087-0630) with a preferred orientation of (111) planes. 25,26 No 2q peaks related to metallic Ti ($38. Figure 2A shows the dark J-V curves of Schottky structures at room temperature (Figure 2A inset); the structures feature a circular front contact (1.0 mm diameter) made of Al (300 nm) or a stack of TiN/Ag (300/200 nm) and a full-area Al contact (300 nm) at the rear.…”

Modeling of Reactive Sputtering—History and Development

“…For the last twenty years at Saint Petersburg Electrotechnical University (LETI, Russia), our group has been studying transition metal oxide, nitride, and oxynitride films deposited by reactive magnetron sputtering [142][143][144][145][146][147][148][149]. Initial interest in a traditional magnetron with a well-cooled metal target (cold target) made it possible to create a sputter assembly with a hot target [150][151][152][153] and then with a sandwich target [154][155][156][157][158][159]. The study of the processes that occur during film deposition using these tools inevitably led to modeling [160][161][162][163][164][165].…”

“…In recent years, the hot-target magnetron has gained increased attention among specialists [150][151][152][155][156][157][177][178][179][180][181][182]. A feature of this device is that its target can be heated to melting.…”