1999
DOI: 10.1007/bf03185602
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Influence of surface damage on highly segmented silicon detectors

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Cited by 4 publications
(2 citation statements)
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“…In contrast to bulk damage, surface damage originates in ionization energy losses of X-ray photons or charged particles and subsequently leads to an accumulation of space charges in or close to an interface between e.g. an insulating or dielectric layer and silicon [18]. A typical example are interfaces between SiO 2 and silicon when SiO 2 is used as gate oxide or field oxide as an insulating layer between semiconductor structures.…”
Section: Radiation-induced Damage Effects On Silicon Detectorsmentioning
confidence: 99%
“…In contrast to bulk damage, surface damage originates in ionization energy losses of X-ray photons or charged particles and subsequently leads to an accumulation of space charges in or close to an interface between e.g. an insulating or dielectric layer and silicon [18]. A typical example are interfaces between SiO 2 and silicon when SiO 2 is used as gate oxide or field oxide as an insulating layer between semiconductor structures.…”
Section: Radiation-induced Damage Effects On Silicon Detectorsmentioning
confidence: 99%
“…Generally, as for the majority of silicon-based photodetectors, the radiation damage can affect both the surface and the bulk regions [13,14] through ionizing energy loss (IEL) and not-ionizing energy loss (NIEL) respectively, introducing defects and recombination centers. Depending on the energy and the particle type, either one or the other type of damage is more relevant and likely to happen.…”
Section: Introductionmentioning
confidence: 99%