2016
DOI: 10.1039/c5nr07938a
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Influence of substrate misorientation on the photoluminescence and structural properties of InGaAs/GaAsP multiple quantum wells

Abstract: InGaAs/GaAsP multiple quantum wells (MQWs) were grown by metal-organic chemical vapor deposition on vicinal GaAs (001) substrates with different miscut angles of 0°, 2° and 15° towards [110]. The crystal structures of InGaAs/GaAsP were characterized by high-resolution X-ray diffraction and Raman spectroscopy. The surface morphologies of InGaAs/GaAsP MQWs were observed by atomic force microscopy. The mechanisms for step flow, step bunching and pyramid growth on 0°, 2° and 15° misoriented substrates were discuss… Show more

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Cited by 21 publications
(14 citation statements)
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“…The large-sized QDs are formed only on the misoriented surface, cover many atomic steps, and likely appear due to coalescence of individual QWDs. The impact of surface misorientation angle was also studied in [18]. InGaAs/GaAsP multiple quantum wells (MQWs) were grown by MOVPE on vicinal GaAs (001) substrates with different miscut angles of 0°, 2°, and 15° towards [110].…”
Section: Growth and Structural Propertiesmentioning
confidence: 99%
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“…The large-sized QDs are formed only on the misoriented surface, cover many atomic steps, and likely appear due to coalescence of individual QWDs. The impact of surface misorientation angle was also studied in [18]. InGaAs/GaAsP multiple quantum wells (MQWs) were grown by MOVPE on vicinal GaAs (001) substrates with different miscut angles of 0°, 2°, and 15° towards [110].…”
Section: Growth and Structural Propertiesmentioning
confidence: 99%
“…The large-sized QDs are formed only on the misoriented surface, cover many atomic steps, and likely appear due to coalescence of individual QWDs. The impact of surface misorientation angle was also studied in [18]. InGaAs/GaAsP multiple quantum wells (MQWs) were grown by MOVPE on vicinal GaAs (001) substrates with different miscut angles of 0 Since the growth of QWDs is accompanied by a partial relaxation of elastic strain, there is no fast strain accumulation upon the stacking of QWD layers, and misfit dislocation formation is suppressed.…”
Section: Growth and Structural Propertiesmentioning
confidence: 99%
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“…Одним из подходов, широко используемых при произ-водстве оптоэлектронных компонент и активно развива-емых в последнее время, является рост на подложках с разориентацией [6][7][8].…”
Section: Introductionunclassified
“…• , и в гетеростуктурах с квантовыми ямами [7], выращенных на подложках GaAs(100) с высоким отклонением от направления [110], использование разориентированных подложек позволи-ло эффективно управлять морфологией поверхности и оптическими характеристиками образцов.…”
Section: Introductionunclassified