Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

Deposition of a titanium carbonitride coating by magnetron sputtering on a substrate with a potential voltage

“…The deposition rate (Figure 1, red line) decreases starting from the sample without substrate voltage to substrate bias -130 V from 0.72 to 0.39 μm/h, respectively. The reason for this is probably the effect of re-sputtering due to ion bombardment or surface growth by incoming ions, as noted in works [6,[20][21][22][23]. The negative bias voltage applied to the substrate provides continuous ion bombardment of the substrate.…”

“…The negative bias voltage applied to the substrate provides continuous ion bombardment of the substrate. This is called re-sputtering, which reduces the DR of the TiCN coatings [6]. The effect of the applied negative bias voltage on the chemical composition of TiCN coatings deposited at different Us is shown in Figure 2.…”

“…To date, various physical and chemical deposition technologies are used to obtain TiCN coatings. There are such methods as magnetron sputtering (MS) [4][5][6], cathode sputtering [7], plasma deposition [8], laser methods [9,10], CVD-based methods [11,12] and hybrid deposition [13,14] and others. Among them, MS is one of the promising methods for the deposition of TiCN coatings with increased wear resistance.…”

Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO2 Coatings

“…In the present work, we limit our 2 Advances in Materials Science and Engineering investigation to the effect of oxygen partial pressure on the TiO 2 films deposited by magnetron sputtering, while keeping the rest of the parameters constant (see Table 1). In order to improve the adhesion of the TiO 2 on steel an intermediate layer of Ti of 200 mm thickness was deposited [14,15] which enhances the nucleation density and reduces the surface roughness of the coating.…”

Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering

“…Titanium and its alloys because of their low density and elastic modulus, high corrosion resistance, biocompatibility and long fatigue life are widely used in spacecraft, automotive, dentistry, orthopedic field and medical industry [1,2]. Various deposition techniques such as chemical vapor deposition (CVD) [3], plasma enhanced chemical vapor deposition (PECVD) [4], magnetron sputtering [5], and thermal spraying [6,7] have been used to deposition of TiCN coatings.…”