2006
DOI: 10.1016/j.ssi.2005.10.021
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Influence of sputtering conditions on ionic conductivity of LiPON thin films

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Cited by 159 publications
(135 citation statements)
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“…Almost same conductivities were obtained for the LiPON films with different thickness. These conductivity and activation energy for conduction are comparable with those previously reported [13].…”
Section: Resultssupporting
confidence: 91%
“…Almost same conductivities were obtained for the LiPON films with different thickness. These conductivity and activation energy for conduction are comparable with those previously reported [13].…”
Section: Resultssupporting
confidence: 91%
“…This is due to the higher density of the corresponding AZTO target: 6.42 g/cm 3 instead of 3.79 g/cm 3 for ATO target (Table 1). Indeed, this result is in full agreement with literature indicating that target density has a drastic effect on the deposition rate [22] even if it is always suitable to have a dense target.…”
Section: Deposition Ratesupporting
confidence: 92%
“…As usually observed, it can be found that the deposition rate of LiPON thin films increases with rf power. According to Hamon et al (2006), the N/P ratio decreases when rf power increases, but an opposite behaviour is observed in our research. Under the same rf power domain as in our study, the N/P ratio increases with rf power, which increases from 0⋅31 to 0⋅75.…”
Section: Resultscontrasting
confidence: 65%