2007
DOI: 10.1016/j.optcom.2006.08.034
|View full text |Cite
|
Sign up to set email alerts
|

Influence of size effect and sputtering conditions on the crystallinity and optical properties of ZnO thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
19
0

Year Published

2008
2008
2020
2020

Publication Types

Select...
10

Relationship

0
10

Authors

Journals

citations
Cited by 63 publications
(20 citation statements)
references
References 13 publications
1
19
0
Order By: Relevance
“…Although dened ZnO nanostructures with different morphologies have been reported using a variety of procedures, [7][8][9][10][11][12]29 existing methods require either harsh conditions, complex procedures or long reaction times. In addition, although it is well-known that the presence of lattice defects plays a key role in the physical and chemical properties of ZnO nanostructures, 10,11 many questions still remain due to the lack of conclusive evidence for defects responsible for luminescence properties.…”
Section: -6mentioning
confidence: 99%
“…Although dened ZnO nanostructures with different morphologies have been reported using a variety of procedures, [7][8][9][10][11][12]29 existing methods require either harsh conditions, complex procedures or long reaction times. In addition, although it is well-known that the presence of lattice defects plays a key role in the physical and chemical properties of ZnO nanostructures, 10,11 many questions still remain due to the lack of conclusive evidence for defects responsible for luminescence properties.…”
Section: -6mentioning
confidence: 99%
“…In recent years, ZnO thin films has reached an important place in new technologies, and shows a wide range of scientific and technological applications (El Hichou et al 2002;Bahedi et al 2007;Dabos-Seignon et al 2007). ZnO thin film is used in the fabrication of solar cells (Lin et al 2007), gas sensors (Lim et al 2006) and catalysers (Miki-Yoshida et al 2002).…”
Section: Introductionmentioning
confidence: 99%
“…Thin film ZnO samples were deposited by radio-frequency (rf) sputtering from a ZnO target [3] in the argon atmosphere with working gas pressure 10 -3 Torr, under sputtering power of 100 W without substrate heating. The distance between substrate and target was about 60 mm.…”
Section: Methodsmentioning
confidence: 99%