2015
DOI: 10.1016/j.spmi.2015.05.020
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Influence of sapphire substrate thickness on the characteristics of AlGaN/AlN/GaN heterostructure field-effect transistors

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Cited by 10 publications
(4 citation statements)
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References 24 publications
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“…Compared with the HEMT, the SPD exhibits that the E 2h mode of GaN shows a blue shift from 566.8 to 569.2 cm −1 . It reveals that the etching process induces a tensile strain relaxation of the GaN layer 30 . The lattice mismatch between III-nitrides and silicon substrate can lead to a high tensile strain.…”
Section: Resultsmentioning
confidence: 97%
“…Compared with the HEMT, the SPD exhibits that the E 2h mode of GaN shows a blue shift from 566.8 to 569.2 cm −1 . It reveals that the etching process induces a tensile strain relaxation of the GaN layer 30 . The lattice mismatch between III-nitrides and silicon substrate can lead to a high tensile strain.…”
Section: Resultsmentioning
confidence: 97%
“…In order to better understand the specific advantages of the dry etching process for thinning substrate, we compared three different substrate-thinning processes, such as chemical mechanical polishing (CMP) [25][26][27], wet corrosion [28], and dry etching [6,19,29]. Among them, the CMP will cause the substrate to produce unrecoverable deformation and introduce new residual stress; the wet corrosion is commonly isotropic, and the corrosion rate is not controllable.…”
Section: Resultsmentioning
confidence: 99%
“…The MPD exhibits that the E 2h phonon mode of GaN shows a blue shift from 568.31 cm −1 to 569.33 cm −1 compared with the HEMT, which reveals that the dry etching process releases the silicon substrate and relaxes the tensile strain of the GaN layer. [33,41] The alleviation of the tensile strain of the GaN layer will partially weaken the piezoelectric polarization effect of the GaN layer, thereby reducing the 2DEG concentration in the AlGaN/AlN/GaN heterojunction. The relationship between the biaxial stress and the shift of the Raman phonon frequency is shown in Equation (1).…”
Section: The Design and Performance Of Mpdmentioning
confidence: 99%