Influence of polycrystalline material on crater shape optimization and roughness using low-power/low-pressure direct-current glow discharge mass spectrometry

Abstract

<p>It is likely that observation of roughness at crater bottom upon GDMS sputtering is due to differential sputtering of grains.</p>

Depth Profile Analysis of Molybdenum Disulfide Film by Glow Discharge Mass Spectrometry

“…18 The discharge conditions (such as discharge pressure, current, and voltage) should be optimized to obtain craters with a flat bottom, straight vertical sides, and no redeposition at the edges. [32][33][34] Previous studies have reported that the edge effect close to the crater rim possibly decreases the depth resolution of the interface. 18 Moreover, the roughness of the crater bottom increases with sputtering time, which induces a broadening of the expected profiles.…”