2011
DOI: 10.1016/j.tsf.2011.01.197
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Influence of PECVD parameters on the properties of diamond-like carbon films

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Cited by 64 publications
(42 citation statements)
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“…As example, smooth a-CH x films has been observed at low pressure work conditions, whereas the development of rougher microstructures were possible by increasing the pressure [13]. Other experimental parameters can provide different ratios of sp 2 and sp 3 carbon bonds and hydrogen contents [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…As example, smooth a-CH x films has been observed at low pressure work conditions, whereas the development of rougher microstructures were possible by increasing the pressure [13]. Other experimental parameters can provide different ratios of sp 2 and sp 3 carbon bonds and hydrogen contents [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Plasma pre-treatments and DLC depositions are performed in a PECVD apparatus (Caschera et al 2011) operating at 13.56 MHz and room temperature. The H 2 or O 2 plasma etching is performed on the cotton substrates at room temperature and at 50 W RF power for 10, 30 and 60 min and 10 sccm of gas flow.…”
Section: Methodsmentioning
confidence: 99%
“…Synthesis of high-quality and controllable carbon films has been a hot spot for decades. Alternatively, ethanol has been considered as a useful precursor since its low-cost and environment-friendly [7,8]. Furthermore, plasma enhanced chemical vapor deposition (PECVD) has become a more promising way to prepare carbon film since it can lower deposition temperature and accelerate deposition rate.…”
Section: Introductionmentioning
confidence: 99%