Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films

Vaz, F.; Ferreira, João F.; Ribeiro, E.; Rebouta, L.; Lanceros-Méndez, S.; Mendes, J. A.; Alves, E.; Goudeau, P.; Rivière, J.P.; Ribeiro, F. Ramôa; Moutinho, Ivo; Pischow, K.A.; Rijk, J. De

doi:10.1016/j.surfcoat.2004.01.033

Cited by 146 publications

(50 citation statements)

References 44 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Indeed, in working conditions similar to our experimental parameters, they found tensile residual stress values included between 0 and 200 MPa. Nevertheless, this level is lower than those found by some other authors for TiN films [1,13,14,15]. This difference may be partially explained by different coating conditions (pressure, temperature, bias, etc.…”

contrasting

confidence: 60%

Stoney Formula: Investigation of Curvature Measurements by Optical Profilometer

Ardigò

Ahmed

Besnard

2014

AMR

View full text Add to dashboard Cite

Abstract. Thin films' residual stress is often determined by the Stoney formula, using the measurements of the substrate curvature, even if the required hypotheses are not completely respected. In this study, a 2.2 µm titanium nitride coating was deposited by reactive sputtering on a silicon substrate. The Stoney formula was used in order to calculate the residual stress of the film. The radius of curvature was measured, before and after coating by optical profilometer, considering the whole surface of the sample. The effect of the substrate shape (square and rectangular) with various dimensions was investigated. We showed that the shape of the substrate influence strongly the deformation. Moreover, it was highlighted that the choice of the radius (maximum value, minimum value, mean value, with or without initial curvature correction) is critical to the determination of the stress.

show abstract

contrasting

confidence: 60%

Stoney Formula: Investigation of Curvature Measurements by Optical Profilometer

Ardigò

Ahmed

Besnard

2014

AMR

View full text Add to dashboard Cite

show abstract

“…4). A similar behaviour was reported by Vaz et al for TiN x films also deposited by sputtering [13] in spite of a gradual phase change from α-Ti to ε-Ti 2 N. A slow increase in the hardness of TiAlN x films up to ≈ 25 at.% of nitrogen was also reported by Malz et al [14] for thin films also deposited by magnetron sputtering. The main cause for this hardness increase is the grain size reduction (Hall-Petch relationship), and consequent dislocation motion reduction, which occurs in order to accommodate the N atoms in the α-Ti lattice.…”

Section: Resultssupporting

confidence: 85%

Structure, hardness and thermal stability of Ti(Al,N) coatings

Oliveira

Manaia²,

Cavaleiro

et al. 2006

Surface and Coatings Technology

View full text Add to dashboard Cite

In the past two decades, coatings of the Ti-Al-N ternary system have attracted considerable research and industrial interest. Nevertheless, the Ti-Al-N system still offers new interesting possibilities for coating developments such as the addition of low N contents to Ti-Al films in order to reach a good compromise between high hardness and a low friction coefficient.Ti-Al-N coatings with low nitrogen content were deposited by closed field unbalanced magnetron sputtering using two facing Ti targets inserted with Al rods. The Al/(Al + Ti) and N/(Al + Ti + N) atomic ratios were varied from 21 to 28 at.% and 0 to 33 at.%, respectively.Hexagonal close-packed (hcp) α-Ti with a preferential b001N orientation was the only phase detected by X-ray diffraction in the as-deposited films. A decrease in the α-Ti c lattice parameter was observed as aluminium was added to the films. Nitrogen addition increased the c lattice parameter and led to a progressive loss of crystallinity until quasi-amorphous films were obtained. A hardness of ≈13 GPa was obtained for the as-deposited films without nitrogen. A continuous increase in hardness was observed with increasing nitrogen content. The highest hardness values (up to 27 GPa) were obtained for the quasi-amorphous films. Annealing of the films with low aluminium content (Al/Al + Ti ≈ 21 at.%) did not significantly affect their structure as hcp Ti remains the only phase detected. On the contrary, annealing of the films deposited with higher aluminium contents (Al/(Al + Ti) ≈ 24 and ≈ 28 at.%) resulted in the formation of face centered cubic (fcc) Al or Ti 3 Al, showing that the thermal stability of the films decreased with aluminium incorporation.

show abstract

“…Thus, for a time period in the range of days, the elapsed time between the deposition of the TiN film and the CJ fabrication does not appear as a critical parameter that is inducing variability in our experiments. Considering the measured elastic strain 2 of ε = 3.1 nm μm − 1 , the biaxial Young's modulus of the ALD deposited TiN film can be estimated to E' = σ/ε≈530 GPa, which is consistent with values reported in literature for sputtered TiN 26 .…”

Section: Measurement Of the Internal Stresssupporting

confidence: 88%

Design and fabrication of crack-junctions

2017

View full text Add to dashboard Cite

Nanogap electrodes consist of pairs of electrically conducting tips that exhibit nanoscale gaps. They are building blocks for a variety of applications in quantum electronics, nanophotonics, plasmonics, nanopore sequencing, molecular electronics, and molecular sensing. Crack-junctions (CJs) constitute a new class of nanogap electrodes that are formed by controlled fracture of suspended bridge structures fabricated in an electrically conducting thin film under residual tensile stress. Key advantages of the CJ methodology over alternative technologies are that CJs can be fabricated with wafer-scale processes, and that the width of each individual nanogap can be precisely controlled in a range from o 2 to 4100 nm. While the realization of CJs has been demonstrated in initial experiments, the impact of the different design parameters on the resulting CJs has not yet been studied. Here we investigate the influence of design parameters such as the dimensions and shape of the notches, the length of the electrode-bridge and the design of the anchors, on the formation and propagation of cracks and on the resulting features of the CJs. We verify that the design criteria yields accurate prediction of crack formation in electrode-bridges featuring a beam width of 280 nm and beam lengths ranging from 1 to 1.8 μm. We further present design as well as experimental guidelines for the fabrication of CJs and propose an approach to initiate crack formation after release etching of the suspended electrode-bridge, thereby enabling the realization of CJs with pristine electrode surfaces.

show abstract

Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films

Cited by 146 publications

References 44 publications

Stoney Formula: Investigation of Curvature Measurements by Optical Profilometer

Stoney Formula: Investigation of Curvature Measurements by Optical Profilometer

Structure, hardness and thermal stability of Ti(Al,N) coatings

Design and fabrication of crack-junctions

Contact Info

Product

Resources

About