2015
DOI: 10.1016/j.mseb.2015.06.006
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Influence of Na diffusion on thermochromism of vanadium oxide films and suppression through mixed-alkali effect

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Cited by 16 publications
(6 citation statements)
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“…32,33 Also, Li 2 O or Li + is a typical network modifying agent, contributing to structural densification. [34][35][36][37] The reaction between the dopant and the matrix phase is studied and results show that the mechanism is exactly the same in all cases. Compared with Cs + , Li + is an intermediate cation with a stronger electric field intensity in glass-ceramics system.…”
Section: (4) Sintering Mechanismmentioning
confidence: 99%
“…32,33 Also, Li 2 O or Li + is a typical network modifying agent, contributing to structural densification. [34][35][36][37] The reaction between the dopant and the matrix phase is studied and results show that the mechanism is exactly the same in all cases. Compared with Cs + , Li + is an intermediate cation with a stronger electric field intensity in glass-ceramics system.…”
Section: (4) Sintering Mechanismmentioning
confidence: 99%
“…Glasses with multiple types of alkali ions (mixed‐alkali glasses) are known to exhibit a typical non‐linearity in their transport properties 55‐57 . Although not well defined, the non‐linearity is by the virtue of mobility of one alkali ion in the presence of another alkali ion with a different ionic radius 55,57 .…”
Section: Resultsmentioning
confidence: 99%
“…Glasses with multiple types of alkali ions (mixed-alkali glasses) are known to exhibit a typical non-linearity in their transport properties. [55][56][57] Although not well defined, the non-linearity is by the virtue of mobility of one alkali ion in the presence of another alkali ion with a different ionic radius. 55,57 It seems that the presence of two or more alkali ions in glasses has localized competitive effect, similar to electron-electron interactions in conductors.…”
Section: Glasses With Mixed-alkali Ionsmentioning
confidence: 99%
“…Each of the deposition processes was carried out for 75 mins, which resulted in a nominal film thickness of 550 nm. The process was controlled carefully since the structure and properties of reactively-sputtered thin films are known to rely strongly on the processing conditions [23][24][25][26][27]. After deposition, samples were annealed in quiescent air at 450°C for 30 mins using a Barnstead Thermolyne 47900 furnace.…”
Section: Methodsmentioning
confidence: 99%