We investigated the growth of InGaN films of 10 nm and thicker on GaN at different temperatures with insitu ellipsometry, ex‐situ X‐ray diffraction and atomic force microscopy. Depending on growth temperature all layers showed at least one distinct growth mode transition either to a coherently strained lateral decomposed rough layer or to a relaxed layer. Indium incorporation on the relaxed layer was much higher, with an activation energy of ≈ 0.6 eV compared to the strained layer (EA ≈ 2.1 eV).
The growth apparently proceeds first as a smooth homogeneous layer in the Stranski‐Krastanov growth mode. After the onset of 3D growth the layer is still fully strained but lateral decomposition sets on, because the heighest areas can expand horizontally more easily and thus incorporate more indium. Finally the critical thickness is reached and the layer starts to relax. The critical thickness for Stranski‐Krastanov is proportional to xIn –1 and the critical thickness for relaxation is proportional xIn –2 (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)