Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

Stepanović, Olivera; Berndt, Johannes; Winter, J.

doi:10.1016/j.tsf.2007.11.029

Cited by 5 publications

(8 citation statements)

References 91 publications

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“…The gas ratio between reactive gas (CO 2 or N 2 ) and monomer gas (C 2 H 4 ) was kept at 2:1, while the flow rates were varied as 4:2 (sccm), 8:4, and 12:6 (with 8, 16, and 24 sccm H 2 in N 2 /H 2 /C 2 H 4 , respectively). Hydrogen was added in N 2 /C 2 H 4 mixtures in order to suppress the formation of dust particles 26…”

Section: Methodsmentioning

confidence: 99%

Macroscopic Approach to Plasma Polymerization Using the Concept of Energy Density

Hegemann

Schütz

Körner

2011

Plasma Processes & Polymers

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The film growth and the properties of plasma polymers are determined by gas phase and surface reactions. In order to gain more insights and to optimize plasma polymerization processes, some assumptions can be made that allow a macroscopic approach. Therefore, a concept was developed based on the energy input both into the gas phase (plasma) and during film growth (surface) that helps to distinguish between predominating gas phase or surface processes. Different experimental series using gas mixtures of C2H4 with CO2 or N2/H2 were performed at different power inputs W and gas flow rates F. Thereby, the same range of specific energy input W/F can be maintained at different ion bombardment to the substrate. The results indicate that changes in film growth were initiated by plasma chemical processes for CO2/C2H4 discharges (scavenger effects), while the obtained drop in deposition rate at high energy input values for N2/H2/C2H4 is caused by the energy dissipated in the film during growth pointing towards a threshold energy for chemical sputtering.

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Section: Methodsmentioning

confidence: 99%

Macroscopic Approach to Plasma Polymerization Using the Concept of Energy Density

Hegemann

Schütz

Körner

2011

Plasma Processes & Polymers

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“…It was shown that the particle material properties are mainly determined by the hydrogen content and the carbon bonding hybridization ratio (sp 3 , sp 2 , sp 1 ). In discharges containing acetylene, the hydrogen content is often controlled by dilution of C 2 H 2 in hydrogen, pure acetylene plasma resulting in carbon‐rich particles and coatings . In our experiments, carbon rich fragments were introduced in plasma phase by acetylene fragmentation while hydrogen rich fragments were mainly controlled by the adamantane amount.…”

Section: Measurements and Resultsmentioning

confidence: 99%

Hydro‐carbon material design in a capacitively coupled radio‐frequency discharge

Mitic

Coussan

Martin

et al. 2017

Plasma Processes & Polymers

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The synthesis and the growth of carbonaceous microparticles is observed in a capacitively coupled radio‐frequency discharge in controlled adamantane‐acetylene gas mixtures. The plasma is characterized by optical emission spectroscopy and mass spectroscopy while the produced particles were analyzed ex situ using Fourier‐Transform infrared absorption spectroscopy. It is revealed that the adamantane to acetylene ratio controlled the particle material properties, in particular the type of chemical bonds between the constituting polymers. Systematic and consistent changes in plasma parameters when changing the adamantane to acetylene ratio are also reported and are correlated to the evolution of particle material properties.

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“…We used an ICP reactor (figure 1) which is described in detail elsewhere [28,30]. It was equipped with a loadlock chamber and a transfer rod to introduce samples.…”

Section: Icpmentioning

confidence: 99%

“…The main gas component for high dissociation rates is then H 2 . It has been shown that a large fraction of atomic hydrogen, which is produced by dissociation of H 2 , supresses the formation of particles [30].…”

Section: Icpmentioning

confidence: 99%

“…This transition is easily observed by the naked eye due to the significant jumps in emission intensity of the plasma. Higher energy in the plasma may quench the particle formation due to a high dissociation degree of the monomer and large concentrations of atomic hydrogen [9,30] and due to particles heating up to destruction. The latter is mainly due to the large ion fluxes hitting the particles and the recombination energy associated with this.…”

Section: Dust Measurements In the Plasma Volumementioning

confidence: 99%

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Monitoring particle growth in deposition plasmas

Schlebrowski

Bahre

Böke

et al. 2013

Plasma Sources Sci. Technol.

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Plasma-enhanced chemical vapor deposition methods are frequently used to deposit barrier layers, e.g. on polymers for food packaging. These plasmas may suffer from particle (dust) formation. We report on a flexible monitoring system for dust. It is based on scanning a 3D plasma volume for particles by laser light scattering. The lower size limit of particles detected in the presented system is 20 nm. We report on existence diagrams for obtaining dust free or dust loaded capacitively or inductively coupled rf-plasmas in C 2 H 2 depending on pressure, flow and rf-power. We further present growth rates for dust in these plasmas and show that monodisperse particles are only obtained during the first growth cycle.

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Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

Cited by 5 publications

References 91 publications

Macroscopic Approach to Plasma Polymerization Using the Concept of Energy Density

Macroscopic Approach to Plasma Polymerization Using the Concept of Energy Density

Hydro‐carbon material design in a capacitively coupled radio‐frequency discharge

Monitoring particle growth in deposition plasmas

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