Influence of growth temperature on physical properties of ZnO films produced by pulsed laser deposition method

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

“…These observations suggest that there could be an optimum range of substrate temperature to obtain the best surface quality. This is in agreement with the results of other studies [18][19][20]. For example, Liu et al [21] observed similar phenomena for ZnO coatings obtained by the PLD method.…”

Deposition of ZnO thin films from aqueous solution in a low power plasma reactor

“…The usual deposition techniques used to elaborate doped and undoped ZnO are Pulsed Laser Deposition (PLD) [5,6], Atomic Layer Deposition (ALD) [7,8], sol-gel [9,10], Metal Organic Chemical Vapor Deposition (MOCVD) [11,12], Sputtering [13,14] and electrodeposition [15,16]. Table 1 summarizes some working parameters which control these techniques; such as the nature of precursors, the pressure, the temperature and the power.…”

Dimensional effects in exciton and defect-related luminescence of ZnO-based step quantum wells

“…As this takes place, the integral intensity of the green band I GB in the range of well widths from 12 to 6 nm remains almost unchanged and amounts to ≈20% of the integral I tot . The radiation nature in the green spectral region is explained by deep energy levels inside the band gap, formed by defects of the kind of vacancies and replacements [20,21].…”