2020
DOI: 10.1088/1361-6528/ab98ba
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Influence of flexible substrate in low temperature polycrystalline silicon thin-film transistors: temperature dependent characteristics and low frequency noise analysis

Abstract: The carrier transport of p-type low temperature polycrystalline silicon (LTPS) thin-film transistors (TFTs) on flexible substrate has been intensively studied and compared to that on glass substrate in order to improve device performance. To investigate the origin of carrier transport on different substrates, temperature dependent characterizations are carried out for electrical device parameters such as threshold voltage (V TH ), subthreshold swing (SS), on-current (I on ) and effective carrier mobility (µ ef… Show more

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Cited by 6 publications
(3 citation statements)
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“…Typically, cellulose papers are fabricated by vacuum filtration, , solvent casting, ,, and partial dissolution of the fiber surface, which show a relatively high thickness due to the lack of thickness control ability. When the papers have similar properties, thinner papers are preferred that they are more applicable to smaller optoelectronic devices and have better bending stability due to the reduced bending radius causing less mechanical strain to the activation layer in flexible devices, etc.…”
Section: Introductionmentioning
confidence: 99%
“…Typically, cellulose papers are fabricated by vacuum filtration, , solvent casting, ,, and partial dissolution of the fiber surface, which show a relatively high thickness due to the lack of thickness control ability. When the papers have similar properties, thinner papers are preferred that they are more applicable to smaller optoelectronic devices and have better bending stability due to the reduced bending radius causing less mechanical strain to the activation layer in flexible devices, etc.…”
Section: Introductionmentioning
confidence: 99%
“…S ID /I D 2 at 10 Hz shows a similar trend to (g m /I D ) 2 for all device splits. This can be interpreted by the CNF+CMF model as [56][57][58] −2 trends. Thus, the CNF + CMF model is appropriate for evaluating N t .…”
Section: Methodsmentioning
confidence: 97%
“…This implies that LFN follows the correlated carrier number and mobility fluctuations (CNF + CMF) caused by carrier trapping/de-trapping near the gate oxide and IGZO channel interface. The CNF + CMF model is as follows: [56][57][58] where α is the Coulomb scattering coefficient, C OX is the capacitance of the gate oxide, and g m is the transconductance. S vfb is the flat-band voltage noise power spectral density.…”
Section: Device Characteristics Of Dual-gate A-igzo Tftsmentioning
confidence: 99%