Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films

Effects of Deposition Conditions on Carbon-Film Resistivity and Microstructure

“…Only at T s > 500°C were the halos transformed into broadened lines peculiar to the structure of polycrystalline graphite [10].…”

“…The resistivity was measured by depositing nickel film contacts by the method of [10]; the resistance was measured parallel (R || ) to the substrate surface and perpendicular to it (R ⊥ ). For that purpose, nickel contacts were deposited on the carbon film [10].…”

“…For that purpose, nickel contacts were deposited on the carbon film [10]. The resistivities ρ || and ρ ⊥ were calculated from the measured R || and R ⊥ , together with the film thickness and metal contact configuration.…”

“…It has been shown [2,3,5,8,[10][11][12] that the properties and structures of amorphous carbon (a-C) films are determined in the main by the substrate temperature and particle energy on condensation. Raising the substrate temperature reduces the resistivity in the direction parallel to the substrate surface [2,8,10], the density [3,8] and Young's modulus [12].…”

“…Raising the substrate temperature reduces the resistivity in the direction parallel to the substrate surface [2,8,10], the density [3,8] and Young's modulus [12]. Increasing the energy of the C + ions on deposition from an ion beam increases the density and resistivity [11].…”