“…Furthermore, Aluminium oxide possesses the low thermal expansion coefficient (Jaymes et al, 1996), high chemical durability, and good mechanical property, which are benefit to Al 2 O 3 film derived from sol-gel solutions on Si wafer substrate. It is very important for the application of the optical devices (Jimenez de Castro et al, 2000;Wang et al, 2004aWang et al, , 2004bArmelao et al, 2005). In order to prevent the clustering of erbium ions in the silica network, Al ions could be added into the silicon oxide structure or completely aluminum oxide structure.…”