Influence of argon gas flow on mechanical and electrical properties of sputtered titanium nitride thin films

Khojier, K.; Savaloni, Hadi; Shokrai, Ebrahim; Dehghani, Zohreh; Dehnavi, N. Zare

doi:10.1186/2251-7235-7-37

Cited by 35 publications

(23 citation statements)

References 26 publications

(3 reference statements)

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“…Meanwhile, at R = 75%, the XRD diffraction peak broadened, grain size decreased, which resulted in a decreased number of pores (or increased film density) in the structure of the composite layer. This phenomenon further led to increased hardness [43] and a subsequent increase in film brittleness. Therefore, when considering that acoustic signals are discontinuous discrete signals, the film-substrate binding force slightly declined when this signal was relatively weak.…”

Section: Results and Analysis Of The Film-substrate Binding Forcementioning

confidence: 99%

Effect of TiN/C Microstructure Composite Layer on the Adhesion of FDLC Film onto Silicon Substrate

Xiao

Gong

et al. 2018

Coatings

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Deposition techniques of direct current and radio-frequency magnetron sputtering were used to separately prepare TiN/C microstructural composite layer and fluorinated diamond-like carbon (FDLC) film on monocrystalline silicon. The aim was to investigate the effects of microstructural composite layers on the adhesion property of FDLC film. The results indicated that the TiN/C microstructural composite layer can distinguish from the substrate and the FDLC film. After adding the composite layers, the film-substrate binding force significantly increased. When the composite film were prepared at a partial pressure of 0.25, the binding force reached 30.5 N, which was greater than the value of 22.6 N for the sample without composite layers. TiN/C in the composite layers intensified the integration with silicon substrate because the C-C bond acted as a bridge linking the FDLC film to the silicon substrate. Furthermore, the bulges on the surface of the composite layers strengthened the physical bonding of the film with silicon substrates.

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Section: Results and Analysis Of The Film-substrate Binding Forcementioning

confidence: 99%

Effect of TiN/C Microstructure Composite Layer on the Adhesion of FDLC Film onto Silicon Substrate

Xiao

Gong

et al. 2018

Coatings

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“…37) Therefore, considering that the thickness of the TiO 2 layer is less than 5 nm, the tunnel effect surely contributed to the specimen's conductivity. TiC particles (electrically conductive materials) exist between the oxide film and metal Ti or in the oxide film as its structure, but TiC's electrical resistivity is similar to that of metal Ti at approximately 50 μΩ•cm, 14,15) so they may not have caused the significant decrease in electrical resistance.…”

Section: Changes In the Surface Structures Due To Nitricmentioning

confidence: 99%

“…Their electrical resistivity is 25-52 μΩ•cm, almost equal to that of metal titanium. 14,15) Annealing cold-rolled titanium sheets in a vacuum atmosphere readily causes TiC to form on the sheet surfaces, 16) and annealing them in a nitrogen gas atmosphere readily causes TiN and Ti 2 N to do so. 17,18) It has been reported that as an effect of the formation of nitrides, the contact resistance becomes smaller than 10 mΩ•cm 2 .…”

Section: Introductionmentioning

confidence: 99%

Reduction of Contact Resistance on Titanium Sheet Surfaces by Formation of Titanium Carbide and Nitride, and its Stability in Sulfuric Acid Aqueous Solution

et al. 2019

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Separators for solid polymer fuel cells must have a low contact resistance with the carbon paper and stability in a corrosive environment of sulfuric acid in the cell. The titanium surface is highly resistant to corrosion thanks to a passive film but has high contact resistance. In this study, titanium carbide or nitride as the electrical conductor was formed on the surface by annealing commercially pure titanium sheet. The contact resistances of these sheets were evaluated before and after a sulfuric acid aqueous solution exposure test, "with a pH of 4 at 80°C for 4 days", briefly simulating the operating environment. In addition, the same evaluation test was conducted with a surface with TiC formed dipped in nitric acid to enhance the stability in a sulfuric acid solution. The initial contact resistance falls below 10 mΩ•cm 2 by formation of TiC and TiN, Ti 2 N on sheet surface. However, the contact resistance rises to 100 or above after the exposure test because a large amount of TiO 2 precipitates. This is probably because TiC and TiN are dissolved by sulfuric acid, generating TiO 2. By contrast, dipping in nitric acid hardly raises the contact resistance from less than 10 even after the exposure test. It is considered from the results of surface analyses that Ti ion generated by partial dissolution of TiC is turned into TiO 2 by the oxidizability of nitric acid, changing the surface structure covering TiC. It is considered that the newly formed TiO 2 film enhanced stability in a sulfuric environment.

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“…Furthermore, small grain sizes consisting in the crystallographic lattice of the compound, leading to densification of the crystallographic arrangement and hence to obtain this high hardness values. In addition, the hardness of coatings can be affected by crystal lographic orientation, and stoichiometry [19]. Thus, the atainment of the best crystallization quality can be attributed to the highest level of hardness.…”

Section: Fig 3 Cross-section Images Of the Tialvn Coatings Produced mentioning

confidence: 99%

MICROSTRUCTURE, MECHANICAL AND TRIBOLOGICAL BEHAVIOR OF THE TiAlVN COATINGS

Phuong

Luong

Minh

et al. 2018

Acta Metall Slovaca

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In this present work, the TiAlVN coatings were deposited by magnetron sputtering using a single alloy target of Ti60Al30V10. The effect of the argon (Ar) to nitrogen (N2) gas flow ratio on the structure, morphological characteristics and mechanical properties of the TiAlVN coating were investigated. The results of X-ray diffraction show the coatings have only face-centred cubic (fcc) structures at different gas ratio of Ar:N2. FE-SEM observation analysis each of the TiAlVN coatings indicated that the change of the gas ratio affects the surface morphology. The nano-indentation results demonstrated that coatings deposited with the gas ratio of Ar:N2 being 9:1 exhibited the highest hardness and elastic modulus. Moreover, with the various gas ratio of Ar:N2, ball-on-disc against SUJ2 ball in air at room temperature indicated friction coefficient from 0.43 to 0.58 in dry condition and 0.073 to 0.12 in oil condition, respectively, which is related to the surface roughness and grain sizes of the coatings.

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Influence of argon gas flow on mechanical and electrical properties of sputtered titanium nitride thin films

Cited by 35 publications

References 26 publications

Effect of TiN/C Microstructure Composite Layer on the Adhesion of FDLC Film onto Silicon Substrate

Effect of TiN/C Microstructure Composite Layer on the Adhesion of FDLC Film onto Silicon Substrate

Reduction of Contact Resistance on Titanium Sheet Surfaces by Formation of Titanium Carbide and Nitride, and its Stability in Sulfuric Acid Aqueous Solution

MICROSTRUCTURE, MECHANICAL AND TRIBOLOGICAL BEHAVIOR OF THE TiAlVN COATINGS

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