2015
DOI: 10.1142/s0217979215500939
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Influence of applied current density on the nanostructural and light emitting properties of n-type porous silicon

Abstract: Effects of current density on nanostructure and light emitting properties of porous silicon (PS) samples were investigated by field emission scanning electron microscope (FE-SEM), gravimetric method, Raman and photoluminescence (PL) spectroscopy. FE-SEM images have shown that below 60 mA/cm 2 , macropore and mesopore arrays, exhibiting rough morphology, are formed together, whose pore diameter, pore depth and porosity are about 265-760 nm, 58-63 µm and 44-61%, respectively. However, PS samples prepared above 6… Show more

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Cited by 7 publications
(6 citation statements)
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“…The peak at 615 cm −1 is due to "wagging" vibrations of Si-H bonds (TO + TA) [21]. The broad and intense band spanning the region from 900 to 1000 cm −1 is due to stretching modes of Si-OH bonds on the surface [13]. We did not observe a 480 cm −1 peak in the Raman spectra of all samples which indicates that there is no amorphous Si in the structure [22].…”
Section: Raman Analysesmentioning
confidence: 76%
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“…The peak at 615 cm −1 is due to "wagging" vibrations of Si-H bonds (TO + TA) [21]. The broad and intense band spanning the region from 900 to 1000 cm −1 is due to stretching modes of Si-OH bonds on the surface [13]. We did not observe a 480 cm −1 peak in the Raman spectra of all samples which indicates that there is no amorphous Si in the structure [22].…”
Section: Raman Analysesmentioning
confidence: 76%
“…Five fundamental Raman bands of PSi are observed at the 301, 430, 515, 615, 970 cm −1 . Among these, 301 cm −1 and 515.5 cm −1 peaks are due to 2TA and TO phonon modes of Si [13]. The peak around 430 cm −1 observed in the Raman spectra of PSi and PSi/Co samples is related to a local Si phonon mode due to a compositional disorder and localization in the PSi matrix [20].…”
Section: Raman Analysesmentioning
confidence: 91%
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“…PSi layer was derived via anodization technique by using n-type silicon wafer with orientation of (100) and resistivity of 1–10 Ω cm as defined in recent works. ,, Sigma Aldrich supplied all of the chemicals utilized in this study. Two-step deposition was performed to obtain PSi/Cu 2 O/ZnO nanostructures.…”
Section: Methodsmentioning
confidence: 99%